Numerical modeling of a dielectric modulated surrounding-triple-gate germanium-source MOSFET (DM-STGGS-MOSFET)-based biosensor

A Das, S Rewari, BK Kanaujia, SS Deswal… - Journal of …, 2023 - Springer
This paper presents for the first time an analytical model of a dielectric modulated
surrounding-triple-gate MOSFET with a germanium source-based biosensor, which shows …

Ge/Si interfaced label free nanowire BIOFET for biomolecules detection-analytical analysis

A Das, S Rewari, BK Kanaujia, SS Deswal… - Microelectronics …, 2023 - Elsevier
This paper comprehensively investigates a dielectric modulated Ge/Si interfaced label free
nanowire BIOFET for biomolecules detection. The main highlight of this work is the structural …

Analytical modeling and doping optimization for enhanced analog performance in a Ge/Si interfaced nanowire MOSFET

A Das, S Rewari, BK Kanaujia, SS Deswal… - Physica …, 2023 - iopscience.iop.org
This paper critically investigates the effect of doping on different device characteristics of a
Ge/Si interfaced nanowire MOSFET (GSI-NWM) for analog performance enhancement. The …

Physics based numerical model of a nanoscale dielectric modulated step graded germanium source biotube FET sensor: modelling and simulation

A Das, S Rewari, BK Kanaujia, SS Deswal… - Physica …, 2023 - iopscience.iop.org
This paper proposes a novel dielectric modulated step-graded germanium source biotube
FET for label-free biosensing applications. Its integrated structure and unique design …

Analytical investigation of a triple surrounding gate germanium source metal–oxide–semiconductor field‐effect transistor with step graded channel for biosensing …

A Das, S Rewari, BK Kanaujia… - … Journal of Numerical …, 2023 - Wiley Online Library
This paper proposes a compact analytical model and comprehensively investigates the
biosensing performance of a novel dielectric modulated triple surrounding gate germanium …

Back-end-of-line compatible fully depleted CMOS inverters employing Ge p-FETs and α-InGaZnO n-FETs

Y Kang, K Han, A Kumar, C Wang… - IEEE Electron …, 2021 - ieeexplore.ieee.org
In this letter, we demonstrate a complementary metal-oxide-semiconductor (CMOS) inverter
comprising a germanium p-type field-effect transistor (Ge p-FET) and an amorphous indium …

Quantum confinement effects in extremely thin body germanium n-MOSFETs

P Rastogi, T Dutta, S Kumar, A Agarwal… - … on Electron Devices, 2015 - ieeexplore.ieee.org
We explore the impact of varying channel thickness (from 8 to 1.5 nm) on extremely thin
germanium n-MOSFETs, by explicitly incorporating the quantum confinement effects in the …

Development of two-dimensional materials for electronic applications

X Li, T Gao, Y Wu - Science China. Information Sciences, 2016 - search.proquest.com
Since the first report of promising electrical properties of Molybdenum disulfide (MoS 2)
transistors in 2011, two-dimensional materials with unique properties have attracted great …

Fully depleted Ge CMOS devices and logic circuits on Si

H Wu, DY Peide - IEEE Transactions on Electron Devices, 2016 - ieeexplore.ieee.org
We systematically studied Ge CMOS devices and logic circuits fabricated on a GeOI
substrate, with the novel recessed channel and source/drain structures. Various channel …

Demonstration of Ge nanowire CMOS devices and circuits for ultimate scaling

H Wu, W Wu, M Si, DY Peide - IEEE Transactions on Electron …, 2016 - ieeexplore.ieee.org
In this paper, Ge nanowire (NW) CMOS devices and circuits are analyzed in detail. Various
experiment splits are studied, including device geometry parameters such as the channel …