JH Lau, CT Ko, CY Peng, KM Yang… - Journal of …, 2020 - meridian.allenpress.com
In this investigation, the chip-last, redistribution-layer (RDL)–first, fan-out panel-level packaging (FOPLP) for heterogeneous integration is studied. Emphasis is placed on the …
Diffusion is one of the most critical and key factor for achieving low temperature and low pressure thermocompression bonding. In this work, we propose a novel concept of …
Advanced packaging featuring vertical integration has emerged as a crucial technology facilitating high performance, low power consumption, and compatibility for heterogeneous …
KJ Chen, CC Hsieh, DP Tran, C Chen - Journal of Materials Research and …, 2024 - Elsevier
Abstract Electrodeposited< 111>-oriented nanotwinned Cu (NT-Cu) films consist of micron- scale columnar grains and they are thermally stable up to 400° C. By adding nanoscale …
This paper, for the first time, reports the fabrication of an on-Silicon aperture-coupled 3D Patch antenna using micromachining and low-temperature, low-pressure Copper (Cu) …
VK Sanipini, B Rakesh, AJ Chamanthula… - Materials Today …, 2021 - Elsevier
Abstract Three Dimensional IC (3D IC) integration is one of the emerging technology which suits CMOS applications by stacking various IC layers vertically. In 3D IC, IC Layers are …
Over the period of meticulous scaling IC's are crucially waiting for a platform which is planar. The most important and actual restriction is nothing, but delay of interconnect is almost …
D Pragathi, D Prasad, T Padma, PR Reddy… - Materials Today …, 2021 - Elsevier
Abstract 3D Integration technology is probably the best methodologies among others which suits CMOS applications with in various layers of devices are stacked with high thickness …