The facile preparation of arrays of plasmonic nanoparticles over a square centimeter surface
area is reported. The developed method relies on tailored laser interference lithography …

This work is devoted to the development of nanosphere lithography (NSL) technology, which
is a low-cost and efficient method to form nanostructures for nanoelectronics, as well as …

The rapid advancement of air/water interface coatings transcends multiple domains. These
coatings, valued for expansive coverage, facile acquisition, and economic efficiency, hold …

The purpose of this review is to introduce and present the concept of metallic nanowires as
building-blocks of plasmonically active structures. In addition to concise description of both …

EUV interference lithography records the interference pattern of two diffracted, coherent light
beams, where the pattern resolution is half the diffraction grating resolution. The fabrication …

Extreme ultraviolet interference lithography records the interference pattern of two diffracted,
coherent light beams, where the pattern resolution is half the diffraction grating resolution …

A new methodology is reported to shape template-assisted electrodeposition of Fe-rich, Fe–
Ni–Co nanowires to have a thin nanowire segment using a coupled displacement reaction …

In this report, a novel method to prepare photonic crystals based on the combination of soft-
X-ray interference lithography (XIL) and reactive ion etching (RIE) with a bi-layer photoresist …

A fast and cost efficient approach to fabricate multiple NIL templates with inverse image
tone, modified topography and tunable feature sizes is presented. The nanopatterns from …

Hydrogen silsesquioxane (HSQ) is a versatile inorganic material that has garnered
significant attention in the semiconductor industry, such as in micro-/nano-electromechanical …