Emerging opportunities for 2D semiconductor/ferroelectric transistor‐structure devices

ZD Luo, MM Yang, Y Liu, M Alexe - Advanced Materials, 2021 - Wiley Online Library
Semiconductor technology, which is rapidly evolving, is poised to enter a new era for which
revolutionary innovations are needed to address fundamental limitations on material and …

Energy-efficient tunneling field-effect transistors for low-power device applications: challenges and opportunities

G Nazir, A Rehman, SJ Park - ACS applied materials & interfaces, 2020 - ACS Publications
Conventional field-effect transistors (FETs) have long been considered a fundamental
electronic component for a diverse range of devices. However, nanoelectronic circuits based …

Performance limit of monolayer MoSi 2 N 4 transistors

X Sun, Z Song, N Huo, S Liu, C Yang, J Yang… - Journal of Materials …, 2021 - pubs.rsc.org
Recently, a novel two-dimensional (2D) MoSi2N4 has been successfully synthesized and
features high carrier mobility, moderate bandgap, and outstanding ambient stability (Science …

Integration of ferroelectric materials: an ultimate solution for next-generation computing and storage devices

R Khosla, SK Sharma - ACS applied electronic materials, 2021 - ACS Publications
Over the decades since ferroelectricity was revealed, ferroelectric materials have emerged
as a cornerstone for a wide spectrum of semiconductor technology and electronic device …

Low-voltage organic field-effect transistors: challenges, progress, and prospects

X Ren, Z Lu, X Zhang, S Grigorian, W Deng… - ACS Materials …, 2022 - ACS Publications
The quest for organic field-effect transistors (OFETs) with low operating voltage has become
highly compelling in many application areas, such as medical sensors, radio frequency …

Novel Approach to High κ (∼59) and Low EOT (∼3.8 Å) near the Morphotrophic Phase Boundary with AFE/FE (ZrO2/HZO) Bilayer Heterostructures and High …

V Gaddam, G Kim, T Kim, M Jung, C Kim… - ACS Applied Materials …, 2022 - ACS Publications
We present herewith a novel approach of equally thick AFE/FE (ZrO2/HZO) bilayer stack
heterostructure films for achieving an equivalent oxide thickness (EOT) of 4.1 Å with a …

Ferroelectric polymers for non‐volatile memory devices: a review

H Li, R Wang, ST Han, Y Zhou - Polymer International, 2020 - Wiley Online Library
Ferroelectric memories have attracted great attention for data storage, and ferroelectric
polymers have been widely studied with the development of flexible and wearable devices …

2D ferroelectric devices: working principles and research progress

M Liu, T Liao, Z Sun, Y Gu, L Kou - Physical Chemistry Chemical …, 2021 - pubs.rsc.org
Two-dimensional (2D) ferroelectric materials are promising for use in high-performance
nanoelectronic devices due to the non-volatility, high storage density, low energy cost and …

Recent Advances in Ferroelectric‐Enhanced Low‐Dimensional Optoelectronic Devices

MA Iqbal, H Xie, L Qi, WC Jiang, YJ Zeng - Small, 2023 - Wiley Online Library
Ferroelectric (FE) materials, including BiFeO3, P (VDF‐TrFE), and CuInP2S6, are a type of
dielectric material with a unique, spontaneous electric polarization that can be reversed by …

Leveraging negative capacitance CNTFETs for image processing: An ultra-efficient ternary image edge detection hardware

F Behbahani, MKQ Jooq, MH Moaiyeri… - IEEE Transactions on …, 2021 - ieeexplore.ieee.org
Recently, integrating ferroelectric materials with nanotransistors such as carbon nanotube
field-effect transistors (CNTFETs) has opened new doors for demonstrating a new …