Progress in computational understanding of ferroelectric mechanisms in HfO2

T Zhu, L Ma, S Deng, S Liu - npj Computational Materials, 2024 - nature.com
Since the first report of ferroelectricity in nanoscale HfO2-based thin films in 2011, this silicon-
compatible binary oxide has quickly garnered intense interest in academia and industry, and …

Ferroelectricity in Hafnia: The Origin of Nanoscale Stabilization

X Li, G Ren, H Lu, K Samanta, AK Shah… - arXiv preprint arXiv …, 2024 - arxiv.org
The discovery of ferroelectricity in hafnia-based materials have boosted the potential of
incorporating ferroelectrics in advanced electronics, thanks to their compatibility with silicon …