X-ray lithography has been first proposed almost 50 years ago, and the related LIGA
process around 25 years ago. It is therefore a good time to make an analysis of the …

The development of a solution‐deposited up‐converted distributed feedback laser prototype
is presented. It employs a sol–gel silica/germania soft‐lithographed microcavity and CdSe …

The overexposure process of poly (methyl methacrylate)(PMMA) was studied in detail using
electron-beam lithography. It was found that PMMA films could be directly patterned without …

In this review hybrid organic–inorganic (HOI) resists as emerging materials alternative to
organic polymers for micro and nanolithography are presented and discussed. In particular …

Deep X-ray lithography combined with sol-gel techniques offers facile fabrication of
controlled patterned films. Using sol-gel, different functional properties can be induced; deep …

A current trend of applied research in the field of nanomaterials is the integration of bottom
up and top down fabrication methods. Sol–gel chemistry is widely applied to obtain different …

It is uncommon that materials that need to be incorporated into micro-or nano-device
architectures can be structured directly by lithography. More often the functional material is …

In this article the effects induced by exposure of sol–gel thin films to hard X-rays have been
studied. Thin films of silica and hybrid organic–inorganic silica have been prepared via dip …

Plasmonic resonators have generated much interest in recent years due to their ability to
localize optical energy into thin continuous metallic regions. We present the integration of …

Sol–gel materials based on SiO2 and TiO2 precursors are attractive as a new platform for
planar photonics. Particularly interesting are those based on organically modified silica …