Defect engineering in SiC technology for high-voltage power devices

T Kimoto, H Watanabe - Applied Physics Express, 2020 - iopscience.iop.org
Major features of silicon carbide (SiC) power devices include high blocking voltage, low on-
state loss, and fast switching, compared with those of the Si counterparts. Through recent …

Material science and device physics in SiC technology for high-voltage power devices

T Kimoto - Japanese Journal of Applied Physics, 2015 - iopscience.iop.org
Power semiconductor devices are key components in power conversion systems. Silicon
carbide (SiC) has received increasing attention as a wide-bandgap semiconductor suitable …

Bulk and epitaxial growth of silicon carbide

T Kimoto - Progress in Crystal Growth and Characterization of …, 2016 - Elsevier
Silicon carbide (SiC) is a wide bandgap semiconductor having high critical electric field
strength, making it especially attractive for high-power and high-temperature devices …

Mechanisms of growth and defect properties of epitaxial SiC

F La Via, M Camarda, A La Magna - Applied Physics Reviews, 2014 - pubs.aip.org
In the last ten years, large improvements in the epitaxial silicon carbide processes have
been made. The introduction of chloride precursors, the epitaxial growth on large area …

Short minority carrier lifetimes in highly nitrogen-doped 4H-SiC epilayers for suppression of the stacking fault formation in PiN diodes

T Tawara, T Miyazawa, M Ryo, M Miyazato… - Journal of Applied …, 2016 - pubs.aip.org
We investigated the dependency of minority carrier lifetimes on the nitrogen concentration,
temperature, and the injected carrier concentration for highly nitrogen-doped 4H-SiC …

Formation of extended defects in 4H‐SiC epitaxial growth and development of a fast growth technique

H Tsuchida, M Ito, I Kamata… - physica status solidi (b …, 2009 - Wiley Online Library
This paper surveys extended defects in 4H‐SiC epilayers and reports recent results
concerning fast epitaxial growth. Synchrotron X‐ray topography, transmission electron …

Chloride-based CVD growth of silicon carbide for electronic applications

H Pedersen, S Leone, O Kordina, A Henry… - Chemical …, 2012 - ACS Publications
Silicon carbide (SiC) is a fascinating material. In one way, it is very simple; there are only two
atoms building up the crystal—silicon and carbon, where each atom is sp3-hybridized and …

Suppression of stacking fault expansion in a 4H-SiC epitaxial layer by proton irradiation

S Harada, T Mii, H Sakane, M Kato - Scientific Reports, 2022 - nature.com
SiC bipolar degradation, which is caused by stacking fault expansion from basal plane
dislocations in a SiC epitaxial layer or near the interface between the epitaxial layer and the …

Suppression of stacking-fault expansion in 4H-SiC PiN diodes using proton implantation to solve bipolar degradation

M Kato, O Watanabe, T Mii, H Sakane, S Harada - Scientific Reports, 2022 - nature.com
Abstract 4H-SiC has been commercialized as a material for power semiconductor devices.
However, the long-term reliability of 4H-SiC devices is a barrier to their widespread …

Recent advances in 4H-SiC epitaxy for high-voltage power devices

H Tsuchida, I Kamata, T Miyazawa, M Ito… - Materials Science in …, 2018 - Elsevier
This paper reports recent advances in high-quality 4H-SiC epitaxial growth. The modern 4H-
SiC epitaxial reactors, techniques to improve growth rates and large-diameter uniformity and …