This review highlights the most significant advances of the nanofabrication techniques
reported over the past decade with a particular focus on the approaches tailored towards the …

Recently, with scaling down of semiconductor devices, need for nanotechnology has
increased enormously. For nanoscale devices especially, each of the layers should be as …

Publisher Summary This chapter deals with atomic layer deposition (ALD), which is a
chemical gas phase thin film deposition method based on alternate saturative surface …

This year marks the 35th anniversary of the Atomic Layer Deposition (ALD) technology.
While the development of ALD was motivated and successfully demonstrated by thin film …

The Dirac equation for relativistic electron waves is the parent model for Weyl and Majorana
fermions as well as topological insulators. Simulation of Dirac physics in three-dimensional …

Tin dioxide (SnO2) inverse opals (IOs) were developed by a spin-coating-assisted sol–gel
process. The SnO2 IOs exhibited a pore size of∼ 260 nm in the 370 nm sized polystyrene …

Y2O3 films grown with a new liquid Y precursor,(iPrCp) 2Y (iPr-amd), have been
investigated in terms of the chemical properties of the precursor, atomic layer deposition …

Photonic crystal materials are based on a periodic modulation of the dielectric constant on
length scales comparable to the wavelength of light. These materials can exhibit photonic …

We propose and demonstrate the digital resonance tuning of high-Q∕ V m silicon photonic
crystal nanocavities using a self-limiting atomic layer deposition technique. Control of …

Very uniform 2 μm-pitch square microlens arrays (μLAs), embossed on the blank glass side
of an indium-tin-oxide (ITO)-coated 1.1 mm-thick glass, are used to enhance light extraction …