Contact resistance and interfacial engineering: Advances in high-performance 2D-TMD based devices

X Liu, K Xing, CS Tang, S Sun, P Chen, DC Qi… - Progress in Materials …, 2024 - Elsevier
The development of advanced electronic devices is contingent upon sustainable material
development and pioneering research breakthroughs. Traditional semiconductor-based …

Two-Dimensional Organic–Inorganic van der Waals Hybrids

F Cui, V García-López, Z Wang, Z Luo, D He… - Chemical …, 2024 - ACS Publications
Two-dimensional organic–inorganic (2DOI) van der Waals hybrids (vdWhs) have emerged
as a groundbreaking subclass of layer-stacked (opto-) electronic materials. The …

High-Performance Edge-Contact Monolayer Molybdenum Disulfide Transistors 高性能边缘接触单层二硫化钼晶体管

X Xiong, J Xiao, X Shi, S Liu, S Zhu, Y Zhang, R Huang… - Research, 2025 - spj.science.org
Edge contact is essential for achieving the ultimate device pitch scaling of stacked
nanosheet transistors with monolayer 2-dimensional (2D) channels. However, due to large …

Fundamental Understanding of Interface Chemistry and Electrical Contact Properties of Bi and MoS2

SY Kim, Z Sun, J Roy, X Wang, Z Chen… - … Applied Materials & …, 2024 - ACS Publications
The interface properties and thermal stability of bismuth (Bi) contacts on molybdenum
disulfide (MoS2) shed light on their behavior under various deposition conditions and …

[HTML][HTML] High-Performance Edge-Contact Monolayer Molybdenum Disulfide Transistors

J Xiao, X Xiong, X Shi, S Liu, S Zhu, Y Zhang… - …, 2025 - pmc.ncbi.nlm.nih.gov
Edge contact is essential for achieving the ultimate device pitch scaling of stacked
nanosheet transistors with monolayer 2-dimensional (2D) channels. However, due to large …

[HTML][HTML] Effect of physical vapor deposition on contacts to 2D MoS2

M Saifur Rahman, AD Agyapong… - Journal of Applied …, 2024 - pubs.aip.org
Two-dimensional (2D) molybdenum disulfide (MoS 2) holds immense promise for next-
generation electronic applications. However, the role of contact deposition at the …

[HTML][HTML] Contact engineering for two-dimensional van der Waals semiconductors

J Tang, S Li, L Zhan, S Li - Materials Today Electronics, 2024 - Elsevier
Abstract Two-dimensional (2D) semiconductors represent the most promising post-silicon
channel materials for ultimate electronics. However, the unique atomic thickness renders …

Contact Resistance Optimization in MoS Field-Effect Transistors through Reverse Sputtering-Induced Structural Modifications

Y Fa, A Piacentini, B Macco, H Kalisch… - arXiv preprint arXiv …, 2024 - arxiv.org
Two-dimensional material (2DM)-based field-effect transistors (FETs), such as molybdenum
disulfide (MoS ${_2} $)-FETs, have gained significant attention for their potential for ultra …

Hybrid Contact for High‐Performance MoS2 Transistors via Hard‐Mask Scanning Probe Lithography

Z Chen, W Zhu, L Xu, M An, X Zheng - Advanced Materials … - Wiley Online Library
The scaling down of transistors in silicon‐based complementary metal‐oxide‐
semiconductor (CMOS) technology has reached critical limits, necessitating the exploration …

High performance ultrascaled monolayer/bilayer WSe2 FETs achieved by immaculate 2D/2D contacts

J Appenzeller, Z Sun, A Afzalian, P Wu, H Zhang… - 2024 - researchsquare.com
Achieving low contact resistance in p-type transistors remains a critical challenge when
using transition-metal dichalcogenides (TMDs) as channel materials. Deposition of high …