Sensitivity analysis of Al0. 3Ga0. 7N/GaN dielectric modulated MOSHEMT biosensor

A Dastidar, TK Patra, SK Mohapatra… - ECS Journal of Solid …, 2023 - iopscience.iop.org
Emerging and newly proposed devices integrate various materials at different scales (from
nano to submicron), which reveals sensor response. Prefab simulation is in great demand to …

Decreased trap density and lower current collapse in AlGaN/GaN HEMTs by adding a magnetron-sputtered AlN gate

M Jia, HN Zhang, X Wang, CY Liu, TF Pu… - Journal of Physics D …, 2022 - iopscience.iop.org
In this paper, AlN films grown by magnetron sputtering method have been proposed as the
gate insulator layer of AlGaN/GaN high electron mobility transistors (HEMTs) to decrease …

Enhancement in analog/RF and power performance of underlapped dual-gate GaN-based MOSHEMTs with quaternary InAlGaN barrier of varying widths

H Mukherjee, M Kar, A Kundu - Journal of Electronic Materials, 2022 - Springer
An underlapped dual-gate (U-DG) quaternary In 0.05 Al 0.75 Ga 0.2 N/GaN metal–oxide–
semiconductor high-electron-mobility transistor (MOS-HEMT) and a conventional ternary Al …

Drain current sensitivity analysis using a surface potential-based analytical model for AlGaN/GaN double gate MOS-HEMT

P Sriramani, N Mohankumar, Y Prasamsha - Micro and Nanostructures, 2024 - Elsevier
In this research, a surface potential-based drain current model for an AlGaN/GaN
symmetrical double-gate metal oxide semiconductor high electron mobility transistor (DG …

Analog/RF and power performance analysis of an underlap DG AlGaN/GaN based high-K dielectric MOS-HEMT

A Roy, R Mitra, A Mondal, A Kundu - Silicon, 2022 - Springer
This paper exemplifies an exhaustive, figurative and subjective study on the RF performance
and DC characteristics analysis of an Underlapped Double-Gate (U-DG) AlGaN/GaN …

Vertical GaN/InGaN/GaN heterostructure tunnel field-effect transistor: DC and analog/RF performance

S Singh, P Kumari - International Journal of Modern Physics B, 2023 - World Scientific
This work reports an n-type GaN/InGaN/GaN heterostructure vertical double-gate tunnel field-
effect transistor (VTFET) using exhaustive calibrated simulation for the first time …

Impact of varying channel length on Analog/RF performances in a novel n-type Silicon-based DG-JLT.

R Ghosh, S Roy, A Kashyap, A Kundu - Micro and Nanostructures, 2024 - Elsevier
Shrinking MOSFETs suffer performance hits due to short-channel effects and leakage.
Junctionless transistors JLTs emerge as promising alternatives due to simpler fabrication …

Influence of Varying Recessed Gate Height on Analog/RF Performances of a Novel Normally-Off Underlapped Double Gate AlGaN/GaN-based MOS-HEMT

C Chakraborty, A Kundu - IETE Journal of Research, 2024 - Taylor & Francis
Current transistor technology has issues with off-state current which reduces power
efficiency. The paper presents a novel Normally-off Underlapped Dual Gate (U-DG) …

[HTML][HTML] Numerical Study of 2DEG Carrier Density of Quaternary AlInGaN-Based T-Gate MOSHEMT Grown on UWBG-β-Ga2O3 Substrate

N Amina, T Zine-eddine, M Zitouni, S Okba… - Power Electronic Devices …, 2025 - Elsevier
This paper presents a numerical simulation study of an E-mode AlInGaN/AlN/GaN metal
oxide semiconductor high electron mobility transistor (MOSHEMT) grown on an ultra-wide …

A comparative analysis of analog performances of underlapped dual gate AlGaN/GaN based MOS-HEMT and Schottky-HEMT

H Mukherjee, R Dasgupta, M Kar… - 2020 IEEE Calcutta …, 2020 - ieeexplore.ieee.org
This paper presents a comparative and analytical study on the basis of analog performances
of an Underlapped Dual Gate (U-DG) AlGaN/GaN MOS-HEMT with gate oxide and an U-DG …