First-principles calculations of defects in oxygen-deficient silica exposed to hydrogen

PE Blöchl - Physical Review B, 2000 - APS
Hydrogen-related defects and oxygen vacancies in silica are analyzed using first-principles
density-functional calculations. Energetics, structures, charge-state levels, and hyperfine …

Mechanism for stress‐induced leakage currents in thin silicon dioxide films

DJ DiMaria, E Cartier - Journal of Applied physics, 1995 - pubs.aip.org
Leakage currents introduced in the low‐field, direct‐tunneling regime of thin oxides during
high‐field stress are related to defects produced by hot‐electron transport in the oxide layer …

Hydrogen electrochemistry and stress-induced leakage current in silica

PE Blöchl, JH Stathis - Physical review letters, 1999 - APS
Hydrogen-related defects in oxygen-deficient silica, representing the material of a thermal
gate oxide, are analyzed using first-principles calculations. Energetics and charge-state …

Anode hole injection and trapping in silicon dioxide

DJ DiMaria, E Cartier, DA Buchanan - Journal of applied physics, 1996 - pubs.aip.org
Hole injection into silicon dioxide films from the polycrystalline-silicon anode or from the
anode/oxide interface is demonstrated to unequivocally occur for any case where electrons …

Fast and slow border traps in MOS devices

DM Fleetwood - … of the Third European Conference on …, 1995 - ieeexplore.ieee.org
Convergent lines of evidence are reviewed which show that near-interfacial oxide traps
(border traps) that exchange charge with the Si can strongly affect the performance …

Effects of hydrogen transport and reactions on microelectronics radiation response and reliability

DM Fleetwood - Microelectronics Reliability, 2002 - Elsevier
The transport and reactions of hydrogen-related species play critical roles in determining the
ionizing radiation response and long-term reliability of Si-based metal-oxide-semiconductor …

[图书][B] Silicon-based material and devices, two-volume set: materials and processing, Properties and Devices

HS Nalwa - 2001 - books.google.com
This book covers a broad spectrum of the silicon-based materials and their device
applications. This book provides a broad coverage of the silicon-based materials including …

Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models

MR Baklanov, V Jousseaume, TV Rakhimova… - Applied Physics …, 2019 - pubs.aip.org
This paper presents an in-depth overview of the application and impact of UV/VUV light in
advanced interconnect technology. UV light application in BEOL historically was mainly …

Energetics and diffusion of hydrogen in

B Tuttle - Physical Review B, 2000 - APS
We explore the energetics and migration of neutral hydrogen in SiO 2 using ab initio density-
functional calculations. From static minimizations (T= 0), we have calculated the formation …

Electrically detected magnetic resonance study of stress‐induced leakage current in thin SiO2

JH Stathis - Applied physics letters, 1996 - pubs.aip.org
A spin-dependent trap-assisted tunneling current has been detected in a thin 44.5 Å SiO2
film. An electron paramagnetic resonance signal, obtained from the tunnel current, provides …