How illumination treatment affects on copper-assisted chemical etching of silicon wafers
H Tong, T Ma, X Yang, S Li, X Wan, W Ma - Applied Surface Science, 2025 - Elsevier
The electrons transfer and holes injection behaviors have an important effect on the silicon
chemical etching, but how they affect metal-assisted chemical etching (MACE) of silicon is …
chemical etching, but how they affect metal-assisted chemical etching (MACE) of silicon is …
Effects of Bath Composition, Current Density and Annealing Conditions on the Properties of the Electrodeposited Ni Seed Layer for Cu Contacts in Si Solar Cells
O Djema, A Moussi, S Chaouchi, C Yaddaden… - Journal of Electronic …, 2024 - Springer
This work aims to investigate the effect of the bath composition, current density and
annealing conditions on the properties of the electrodeposited nickel (Ni) seed layer for …
annealing conditions on the properties of the electrodeposited nickel (Ni) seed layer for …
[HTML][HTML] Electrochemical behavior of Ni seed layers on polysilicon wafer for solar cells
Y Mo, G Sui, S Chen - International Journal of Electrochemical Science, 2024 - Elsevier
The stripping behaviors of Ni seeds on polysilicon wafers, which were formed by galvanic
displacement in a solution containing fluorine ions, were characterized by cyclic voltammetry …
displacement in a solution containing fluorine ions, were characterized by cyclic voltammetry …