Sub-10 nm fabrication: methods and applications

Y Chen, Z Shu, S Zhang, P Zeng, H Liang… - … Journal of Extreme …, 2021 - iopscience.iop.org
Reliable fabrication of micro/nanostructures with sub-10 nm features is of great significance
for advancing nanoscience and nanotechnology. While the capability of current …

Atomically precise manufacturing of silicon electronics

J Pitters, J Croshaw, R Achal, L Livadaru, S Ng… - ACS …, 2024 - ACS Publications
Atomically precise manufacturing (APM) is a key technique that involves the direct control of
atoms in order to manufacture products or components of products. It has been developed …

The case for a defect genome initiative

Q Yan, S Kar, S Chowdhury, A Bansil - Advanced Materials, 2024 - Wiley Online Library
Abstract The Materials Genome Initiative (MGI) has streamlined the materials discovery effort
by leveraging generic traits of materials, with focus largely on perfect solids. Defects such as …

Tip-based nanofabrication for scalable manufacturing

H Hu, HJ Kim, S Somnath - Micromachines, 2017 - mdpi.com
Tip-based nanofabrication (TBN) is a family of emerging nanofabrication techniques that use
a nanometer scale tip to fabricate nanostructures. In this review, we first introduce the history …

Atomic‐scale manipulation and in situ characterization with scanning tunneling microscopy

W Ko, C Ma, GD Nguyen, M Kolmer… - Advanced Functional …, 2019 - Wiley Online Library
Scanning tunneling microscope (STM) has presented a revolutionary methodology to
nanoscience and nanotechnology. It enables imaging of the topography of surfaces …

In situ XPS study of low temperature atomic layer deposition of B2O3 films on Si using BCl3 and H2O precursors

A Pilli, J Jones, V Lee, N Chugh, J Kelber… - Journal of Vacuum …, 2018 - pubs.aip.org
In this study, atomic layer deposition (ALD) of nanoscale boron oxide (B 2 O 3) films on Si
using BCl 3/H 2 O precursors at room temperature was investigated using in situ x-ray …

Automated extraction of single H atoms with STM: tip state dependency

M Møller, SP Jarvis, L Guérinet, P Sharp… - …, 2017 - iopscience.iop.org
The atomistic structure of the tip apex plays a crucial role in performing reliable atomic-scale
surface and adsorbate manipulation using scanning probe techniques. We have developed …

Resistless EUV lithography: Photon-induced oxide patterning on silicon

LT Tseng, P Karadan, D Kazazis, PC Constantinou… - Science …, 2023 - science.org
In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated
silicon (100) surface in the absence of a photoresist. EUV lithography is the leading …

Quantum information density scaling and qubit operation time constraints of CMOS silicon-based quantum computer architectures

D Rotta, F Sebastiano, E Charbon, E Prati - npj Quantum Information, 2017 - nature.com
Even the quantum simulation of an apparently simple molecule such as Fe2S2 requires a
considerable number of qubits of the order of 106, while more complex molecules such as …

[HTML][HTML] Electron-enhanced atomic layer deposition of silicon thin films at room temperature

JK Sprenger, H Sun, AS Cavanagh… - Journal of Vacuum …, 2018 - pubs.aip.org
Silicon thin films were deposited at room temperature with electron-enhanced atomic layer
deposition (EE-ALD) using sequential exposures of disilane (Si 2 H 6) and electrons. EE …