Microfluidic sensing: state of the art fabrication and detection techniques

J Wu, M Gu - Journal of biomedical optics, 2011 - spiedigitallibrary.org
Here we introduce the existing fabrication techniques, detection methods, and related
techniques for microfluidic sensing, with an emphasis on the detection techniques. A …

Deep wet etching of fused silica glass for hollow capillary optical leaky waveguides in microfluidic devices

A Grosse, M Grewe, H Fouckhardt - Journal of micromechanics …, 2001 - iopscience.iop.org
We report on a technology for the fabrication of hollow capillary optical leaky waveguides in
fused silica glass. The fabrication process is based on lithography, wet chemical etching and …

Cell electrophoresis on a chip: what can we know from the changes in electrophoretic mobility?

T Akagi, T Ichiki - Analytical and bioanalytical chemistry, 2008 - Springer
An overview of both experimental and theoretical studies of cell electrophoresis mobility
(EPM) over the past fifty years and the relevance of cell EPM measurement are presented …

Deep dry etching of borosilicate glass using fluorine-based high-density plasmas for microelectromechanical system fabrication

T Ichiki, Y Sugiyama, T Ujiie, Y Horiike - Journal of Vacuum Science & …, 2003 - pubs.aip.org
For the fabrication of microelectromechanical system devices, deep trench etching of
borosilicate glass (Corning 7740) has been investigated using SF 6/Ar inductively coupled …

Plasma applications for biochip technology

T Ichiki, Y Sugiyama, R Taura, T Koidesawa, Y Horiike - Thin Solid Films, 2003 - Elsevier
Biochip technology has emerged from the fusion of biotechnology and micro/nanofabrication
technology. Biochips enable us to realize revolutionary new bioanalysis systems that can …

Monocrystalline quartz ICP etching: Road to high-temperature dry etching

AA Osipov, GA Iankevich, SE Alexandrov - Plasma Chemistry and Plasma …, 2020 - Springer
In this study, the dry plasma-chemical etching process of monocrystalline SiO 2 (quartz) in a
fluoride-based (sulfur hexafluoride, SF 6) inductively coupled plasma (ICP) was …

Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: Implications for microfluidic devices fabrication

L Lallement, C Gosse, C Cardinaud… - Journal of Vacuum …, 2010 - pubs.aip.org
To fabricate microlaboratories, commercially available silica glasses represent a good
alternative to the expensive quartz or fused silica substrates. Therefore, the authors have …

Column liquid chromatography: equipment and instrumentation

WR LaCourse - Analytical chemistry, 2002 - ACS Publications
This review covers fundamental developments in column liquid chromatography (LC)
equipment and instrumentation for the period of January 2000 through December 2001. As …

Deep reactive ion etching of fused silica using a single-coated soft mask layer for bio-analytical applications

T Ray, H Zhu, DR Meldrum - Journal of Micromechanics and …, 2010 - iopscience.iop.org
In this note, we present our results from process development and characterization of
reactive ion etching (RIE) of fused silica using a single-coated soft masking layer (KMPR® …

An investigation into the characteristics of deep reactive ion etching of quartz using SU-8 as a mask

H Chen, C Fu - Journal of Micromechanics and Microengineering, 2008 - iopscience.iop.org
In this paper, we present our recent investigations into the characteristics of the deep
reactive ion etching (DRIE) of quartz. Three different etching gas mixtures, namely SF 6/Ar …