WP Dow, HS Huang - Journal of The Electrochemical Society, 2005 - iopscience.iop.org
Microvias with various diameters formed by laser ablation on a printed circuit board (PCB) were used to investigate the filling mechanism of the microvia in copper electroplating. The …
WP Dow, HS Huang, MY Yen… - Journal of The …, 2005 - iopscience.iop.org
The interactions among additives employed in acidic copper plating solution for microvia filling are characterized by galvanostatic measurement (GM) and electron paramagnetic …
C Gabrielli, P Moçotéguy, H Perrot, D Nieto-Sanz… - Electrochimica …, 2006 - Elsevier
Copper deposition in a plating bath known to fill narrow trenches was studied on a rotating disc electrode by impedance measurements. The chemistry of this bath contained, in …
Copper electrodeposition in submicron trenches involves phenomena that span many orders of magnitude in time and length scales. In the present work, two codes that simulate …
J Mackerle - Modelling and Simulation in Materials Science and …, 2005 - iopscience.iop.org
This paper gives a bibliographical review of the finite element methods applied to the analysis and simulation of coatings, their mechanical and material properties from the …
SH Liu, JM Shieh, C Chen, K Hensen… - Journal of The …, 2006 - iopscience.iop.org
This study explores how the dissolution of damascene Cu depends on accelerators of organic acids in alcohol-containing electropolishing electrolytes. Four two-additive …
YH Im, MO Bloomfield, S Sen… - Electrochemical and solid …, 2003 - iopscience.iop.org
A model and simulator that describe the dependence of deposition rate and bump formation on pattern density during electrochemical deposition (ECD) are presented. A curvature …
Primary responses to be considered during process optimization for copper electroplating of integrated circuits interconnects include filling performance, within die uniformity, within …
H Kitada, N Shimizu - US Patent 7,329,952, 2008 - Google Patents
When copper is grown by the bottom up growth mecha nism, the phenomena that the grown copper film rises over trenches and hole patterns due to the higher growth rate in the …