Ultrafast Superfilling Construction of a Metal Artificial Interface for Long‐Term Stable Zinc Anodes

Q Jiao, X Zhai, Z Sun, W Wang, S Liu, H Ding… - Advanced …, 2023 - Wiley Online Library
Zinc (Zn)‐metal anodes are promising candidates for large‐scale, highly safe energy‐
storage systems. However, their cycling life is associated with instability issues such as …

Roles of chloride ion in microvia filling by copper electrodeposition: I. studies using SEM and optical microscope

WP Dow, HS Huang - Journal of The Electrochemical Society, 2005 - iopscience.iop.org
Microvias with various diameters formed by laser ablation on a printed circuit board (PCB)
were used to investigate the filling mechanism of the microvia in copper electroplating. The …

Roles of chloride ion in microvia filling by copper electrodeposition: II. Studies using EPR and galvanostatic measurements

WP Dow, HS Huang, MY Yen… - Journal of The …, 2005 - iopscience.iop.org
The interactions among additives employed in acidic copper plating solution for microvia
filling are characterized by galvanostatic measurement (GM) and electron paramagnetic …

A model for copper deposition in the damascene process

C Gabrielli, P Moçotéguy, H Perrot, D Nieto-Sanz… - Electrochimica …, 2006 - Elsevier
Copper deposition in a plating bath known to fill narrow trenches was studied on a rotating
disc electrode by impedance measurements. The chemistry of this bath contained, in …

Coupled mesoscale—continuum simulations of copper electrodeposition in a trench

TO Drews, EG Webb, DL Ma, J Alameda… - AIChE …, 2004 - Wiley Online Library
Copper electrodeposition in submicron trenches involves phenomena that span many
orders of magnitude in time and length scales. In the present work, two codes that simulate …

Coatings and surface modification technologies: a finite element bibliography (1995–2005)

J Mackerle - Modelling and Simulation in Materials Science and …, 2005 - iopscience.iop.org
This paper gives a bibliographical review of the finite element methods applied to the
analysis and simulation of coatings, their mechanical and material properties from the …

Roles of additives in damascene copper electropolishing

SH Liu, JM Shieh, C Chen, K Hensen… - Journal of The …, 2006 - iopscience.iop.org
This study explores how the dissolution of damascene Cu depends on accelerators of
organic acids in alcohol-containing electropolishing electrolytes. Four two-additive …

Modeling pattern density dependent bump formation in copper electrochemical deposition

YH Im, MO Bloomfield, S Sen… - Electrochemical and solid …, 2003 - iopscience.iop.org
A model and simulator that describe the dependence of deposition rate and bump formation
on pattern density during electrochemical deposition (ECD) are presented. A curvature …

Damascene copper electroplating

J Reid - Handbook of semiconductor manufacturing technology, 2017 - taylorfrancis.com
Primary responses to be considered during process optimization for copper electroplating of
integrated circuits interconnects include filling performance, within die uniformity, within …

Method of fabricating a semiconductor device

H Kitada, N Shimizu - US Patent 7,329,952, 2008 - Google Patents
When copper is grown by the bottom up growth mecha nism, the phenomena that the grown
copper film rises over trenches and hole patterns due to the higher growth rate in the …