Thin conducting films are distinct from bulk materials and have become prevalent over the past decades as they possess unique physical, electrical, optical, and mechanical …
DC Reynolds, DC Look, B Jogai, CW Litton, TC Collins… - Physical Review B, 1998 - APS
Neutral-donor–bound-exciton transitions have been observed in ZnO. The isolated neutral donors are made up of defect pair complexes. The neutral-donor nature of these pair …
E Grilli, M Guzzi, R Zamboni, L Pavesi - Physical Review B, 1992 - APS
The photoluminescence (PL) spectra of GaAs have been measured as a function of temperature between 2 and 280 K. Measurements have been performed on a high-quality …
JH Neave, PJ Dobson, JJ Harris, P Dawson, BA Joyce - Applied Physics A, 1983 - Springer
Two concentration ranges of silicon doping in MBE-grown GaAs films have been investigated in some detail. In lightly doped films, with a free-electron concentration of≈ 10 …
BJ Skromme, SS Bose, B Lee, TS Low… - Journal of applied …, 1985 - pubs.aip.org
High‐purity, lightly Si‐doped (μ77∼ 70 000–126 000 cm2/V s and n 77∼ 2–8× 1014 cm− 3) molecular beam epitaxy (MBE) GaAs layers have been characterized using variable …
M Heiblum, EE Mendez, L Osterling - Journal of applied physics, 1983 - pubs.aip.org
We report on the growth by molecular beam epitaxy of high‐quality GaAs and Al x Ga1− x As (x≲ 0.43), and discuss the effect of system parameters on material quality. The highest Hall …
J Van de Ven, HG Schoot, LJ Giling - Journal of applied physics, 1986 - pubs.aip.org
The incorporation of impurities in GaAs epitaxial layers grown from trimethyl gallium (TMG) and AsH3 has been studied in detail by varying a large number of growth parameters. These …
K Kudo, Y Makita, I Takayasu, T Nomura… - Journal of applied …, 1986 - pubs.aip.org
The incorporation mechanisms of residual impurities in GaAs layers grown by molecular‐ beam epitaxy has been investigated by high‐resolution photoluminescence (PL) …
We present the nanoheteroepitaxial growth of gallium arsenide (GaAs) on nano-patterned silicon (Si)(001) substrates fabricated using a CMOS technology compatible process. The …