Photoluminescence spectroscopy of crystalline semiconductors

GD Gilliland - Materials Science and Engineering: R: Reports, 1997 - Elsevier
The objective of this review article is to give an overview of the current state-of-the-art of
photoluminescence (PL) spectroscopy as a characterization tool in the study of …

[HTML][HTML] Thin conducting films: preparation methods, optical and electrical properties, and emerging trends, challenges, and opportunities

RK Sharme, M Quijada, M Terrones, MM Rana - Materials, 2024 - pmc.ncbi.nlm.nih.gov
Thin conducting films are distinct from bulk materials and have become prevalent over the
past decades as they possess unique physical, electrical, optical, and mechanical …

Neutral-donor–bound-exciton complexes in ZnO crystals

DC Reynolds, DC Look, B Jogai, CW Litton, TC Collins… - Physical Review B, 1998 - APS
Neutral-donor–bound-exciton transitions have been observed in ZnO. The isolated neutral
donors are made up of defect pair complexes. The neutral-donor nature of these pair …

High-precision determination of the temperature dependence of the fundamental energy gap in gallium arsenide

E Grilli, M Guzzi, R Zamboni, L Pavesi - Physical Review B, 1992 - APS
The photoluminescence (PL) spectra of GaAs have been measured as a function of
temperature between 2 and 280 K. Measurements have been performed on a high-quality …

Silicon doping of MBE-grown GaAs films

JH Neave, PJ Dobson, JJ Harris, P Dawson, BA Joyce - Applied Physics A, 1983 - Springer
Two concentration ranges of silicon doping in MBE-grown GaAs films have been
investigated in some detail. In lightly doped films, with a free-electron concentration of≈ 10 …

Characterization of high‐purity Si‐doped molecular beam epitaxial GaAs

BJ Skromme, SS Bose, B Lee, TS Low… - Journal of applied …, 1985 - pubs.aip.org
High‐purity, lightly Si‐doped (μ77∼ 70 000–126 000 cm2/V s and n 77∼ 2–8× 1014 cm− 3)
molecular beam epitaxy (MBE) GaAs layers have been characterized using variable …

Growth by molecular beam epitaxy and characterization of high purity GaAs and AlGaAs

M Heiblum, EE Mendez, L Osterling - Journal of applied physics, 1983 - pubs.aip.org
We report on the growth by molecular beam epitaxy of high‐quality GaAs and Al x Ga1− x As
(x≲ 0.43), and discuss the effect of system parameters on material quality. The highest Hall …

Influence of growth parameters on the incorporation of residual impurities in GaAs grown by metalorganic chemical vapor deposition

J Van de Ven, HG Schoot, LJ Giling - Journal of applied physics, 1986 - pubs.aip.org
The incorporation of impurities in GaAs epitaxial layers grown from trimethyl gallium (TMG)
and AsH3 has been studied in detail by varying a large number of growth parameters. These …

Photoluminescence spectra of undoped GaAs grown by molecular‐beam epitaxy at very high and low substrate temperatures

K Kudo, Y Makita, I Takayasu, T Nomura… - Journal of applied …, 1986 - pubs.aip.org
The incorporation mechanisms of residual impurities in GaAs layers grown by molecular‐
beam epitaxy has been investigated by high‐resolution photoluminescence (PL) …

Structural and optical characterization of GaAs nano-crystals selectively grown on Si nano-tips by MOVPE

O Skibitzki, I Prieto, R Kozak, G Capellini… - …, 2017 - iopscience.iop.org
We present the nanoheteroepitaxial growth of gallium arsenide (GaAs) on nano-patterned
silicon (Si)(001) substrates fabricated using a CMOS technology compatible process. The …