Selective doping in silicon carbide power devices

F Roccaforte, P Fiorenza, M Vivona, G Greco… - Materials, 2021 - mdpi.com
Silicon carbide (SiC) is the most mature wide band-gap semiconductor and is currently
employed for the fabrication of high-efficiency power electronic devices, such as diodes and …

Ion implantation doping in silicon carbide and gallium nitride electronic devices

F Roccaforte, F Giannazzo, G Greco - Micro, 2022 - mdpi.com
Wide band gap semiconductors such as silicon carbide (SiC) and gallium nitride (GaN) are
excellent materials for the next generation of high-power and high-frequency electronic …

Incomplete ionization in aluminum-doped 4H-silicon carbide

C Darmody, N Goldsman - Journal of Applied Physics, 2019 - pubs.aip.org
In this work, we investigate the degree of incomplete ionization of Al doped 4H-SiC. In
particular, we perform analysis on a comprehensive list of published measurements of …

Electron mobility along< 0001> and< 11̅00> directions in 4H-SiC over a wide range of donor concentration and temperature

R Ishikawa, M Hara, H Tanaka, M Kaneko… - Applied Physics …, 2021 - iopscience.iop.org
Electron mobility along <0001> and <1<img src="https://cdn.images.iop.org/Entities/overline1.gif"
alt="overline 1" align="baseline" />00> directions in 4H-SiC over a wide range of donor …

Defects related to electrical doping of 4H-SiC by ion implantation

R Nipoti, HM Ayedh, BG Svensson - Materials Science in Semiconductor …, 2018 - Elsevier
This study resumes the status of our knowledge about the formation of extended and
intrinsic defects in ion implanted 4H-SiC homo-epitaxial wafers during a high temperature …

Theoretical analysis of Hall factor and hole mobility in p-type 4H-SiC considering anisotropic valence band structure

H Tanaka, S Asada, T Kimoto, J Suda - Journal of Applied Physics, 2018 - pubs.aip.org
The temperature dependencies of hole density and hole mobility of p-type 4H-SiC obtained
by Hall effect measurement were theoretically analyzed taking account of its anisotropic …

Effect of high temperature annealing (T> 1650 C) on the morphological and electrical properties of p-type implanted 4H-SiC layers

M Spera, D Corso, S Di Franco, G Greco… - Materials Science in …, 2019 - Elsevier
This work reports on the effect of high temperature annealing on the electrical properties of p-
type implanted 4H-SiC. Ion implantations of Aluminum (Al) at different energies (30–200 …

Theoretical study on the improvement of the doping efficiency of Al in 4H-SiC by co-doping group-IVB elements

Y Huang, R Wang, Y Qian, Y Zhang, D Yang… - Chinese Physics …, 2022 - iopscience.iop.org
The p-type doping efficiency of 4H silicon carbide (4H-SiC) is rather low due to the large
ionization energies of p-type dopants. Such an issue impedes the exploration of the full …

Transition of conduction mechanism from band to variable-range hopping conduction due to Al doping in heavily Al-doped 4H-SiC epilayers

H Matsuura, A Takeshita, T Imamura… - Japanese Journal of …, 2019 - iopscience.iop.org
We investigate the transition of the conduction mechanism from band and nearest-neighbor
hopping (NNH) conduction to variable-range hopping (VRH) conduction in heavily Al-doped …

Experimental determination of intrinsic carrier density in 4H-SiC based on electron diffusion current in an npn bipolar junction transistor

S Asada, K Murata, H Tanaka, H Tsuchida - Journal of Applied Physics, 2023 - pubs.aip.org
The intrinsic carrier density of 4H-SiC at temperatures ranging from 294 to 595 K was
derived by analyzing a collector current in an npn-type SiC bipolar junction transistor, the …