[图书][B] Block Copolymer Directed Self-Assembly for Patterning Memory and Logic
MC Tung - 2022 - search.proquest.com
With the anticipated arrival of high-numerical aperture (NA) extreme ultraviolet (EUV)
lithography in the next two years, it is in principle possible to pattern the highest resolution …
lithography in the next two years, it is in principle possible to pattern the highest resolution …
Block Copolymer Self-assembly: From Process Optimization to Optical Properties
GK Ginige - 2022 - era.library.ualberta.ca
Molecular self-assembly is the basis of structure in Nature. While of far less complexity than
a natural system, the same physical rules apply to simple synthetic designed systems that …
a natural system, the same physical rules apply to simple synthetic designed systems that …