Deposition rate enhancement in HiPIMS through the control of magnetic field and pulse configuration
In high power impulse magnetron sputtering (HiPIMS) process, the magnetic field and
unbalance degree and pulsing configuration are key factors in controlling metal ionization …
unbalance degree and pulsing configuration are key factors in controlling metal ionization …
Optical spectroscopy for sputtering process characterization
N Britun, J Hnilica - Journal of Applied Physics, 2020 - pubs.aip.org
In this Tutorial, various methods of optical spectroscopy representing certain interest for
magnetron discharge characterization are overviewed. The main principles, the …
magnetron discharge characterization are overviewed. The main principles, the …
Effect of magnetic field on spoke behaviour in HiPIMS plasma
J Hnilica, P Klein, M Šlapanská… - Journal of Physics D …, 2018 - iopscience.iop.org
The objective of this paper is to study the effect of magnetic field strength on spoke
behaviour in a high power impulse magnetron sputtering discharge. In three magnetic field …
behaviour in a high power impulse magnetron sputtering discharge. In three magnetic field …
Revisiting particle dynamics in HiPIMS discharges. I. General effects
A detailed experimental study of high power impulse magnetron sputtering processes is
performed by time-resolved imaging of the ground state sputtered particles. New details …
performed by time-resolved imaging of the ground state sputtered particles. New details …
Microstructure of titanium coatings controlled by pulse sequence in multipulse HiPIMS
The deposition rate, as well as the structure of a coating for a given magnetron sputtered
material are determined by the plasma properties which are significantly dependent on the …
material are determined by the plasma properties which are significantly dependent on the …
Ionisation fractions of sputtered titanium species at target and substrate region in HiPIMS
K Bernátová, M Fekete, P Klein, J Hnilica… - … Sources Science and …, 2020 - iopscience.iop.org
In this paper, the ground state number densities of titanium atom and ion, ionised density
fraction and ionised flux fraction were determined in a high power impulse magnetron …
fraction and ionised flux fraction were determined in a high power impulse magnetron …
First measurements of the temporal evolution of the plasma density in HiPIMS discharges using THz time domain spectroscopy
SM Meier, A Hecimovic, TV Tsankov… - Plasma Sources …, 2018 - iopscience.iop.org
In this paper, the novel technique of THz time domain spectroscopy has been applied to
obtain time-resolved measurements of the plasma density in the active zone of a HiPIMS …
obtain time-resolved measurements of the plasma density in the active zone of a HiPIMS …
Revisiting particle dynamics in HiPIMS discharges. II. Plasma pulse effects
A detailed experimental study of high power impulse magnetron sputtering discharges is
performed using time-resolved ground state density mapping of the sputtered neutrals and …
performed using time-resolved ground state density mapping of the sputtered neutrals and …
Transition from ballistic to thermalized transport of metal-sputtered species in a DC magnetron
A Revel, A El Farsy, L de Poucques… - … Sources Science and …, 2021 - iopscience.iop.org
Tunable diode-laser induced fluorescence technique has been optimized to accurately
measure the titanium (Ti)-sputtered atom velocity distribution functions (AVDFs) in a …
measure the titanium (Ti)-sputtered atom velocity distribution functions (AVDFs) in a …
Auxiliary capacitor to enhance oscillation in circuit and reduce current onset delay in HiPIMS discharge: Theory, experiment and simulation
In high power impulse magnetron sputtering (HiPIMS) discharge, generally, the current
onset lags the applied pulse voltage by a significant time which can reach to several tens of …
onset lags the applied pulse voltage by a significant time which can reach to several tens of …