Semiconductor lithography is one of the key steps in the manufacturing of integrated silicon-
based circuits. In fabricating a semiconductor device such as a transistor, a series of hot …

An ongoing program on microfabricated field-emitter arrays has produced a gated field-
emitter tip structure with submicrometer dimensions and techniques for fabricating emitter …

Publisher Summary This chapter focuses on vacuum microelectronics—a branch of subject
in which devices with tolerances in the nanometer range rely on the collision-free motion of …

Electron-beam-induced deposition of materials has been known for almost 40 years from
contamination writing. It has developed into" additive lithography" with nanometer resolution …

During the historical development of Vacuum Electronics a lot of review articles and also
several more extensive textbooks have been written on vacuum electron sources, reflecting …

Electron-beam-induced deposition (EBID) is performed with multiwalled carbon nanotube
emitters that are assembled to atomic force microscope cantilevers through nanorobotic …

Microlens array (MLA), through which all the sub-beams are focused, is widely used in multi-
electron-beam systems. In this work, based on the differential algebraic (DA) method, we …

A pattern inspection apparatus is designed to quickly and accurately perform an inspection
of an inspecting sample, such as masks, wafers or so forth by irradiating electron beams …

57 ABSTRACT A pattern inspection apparatus is designed to quickly and accurately perform
an inspection of an inspection sample, such as a mask or a wafer or the like by irradiating …

Résumé Nos récents progrès dans le développement de réseaux de cathodes à émission
de champ ont permis d'atteindre des densités de courant supérieures à 100 A/cm 2. Abstract …