High-energy-density pinch plasma: A unique nonconventional tool for plasma nanotechnology
RS Rawat - IEEE Transactions on Plasma Science, 2013 - ieeexplore.ieee.org
Low-temperature (<; 10 eV) plasmas with densities varying over a very wide range from 10
13 m-3 at the lower end to as high as 10 23 m-3 have firmly established themselves as one …
13 m-3 at the lower end to as high as 10 23 m-3 have firmly established themselves as one …
Room temperature deposition of titanium carbide thin films using dense plasma focus device
Thin films of titanium carbide (TiC) were deposited on 304-stainless steel substrates using a
dense plasma focus device. The conventional hollow copper anode of the 3.3 kJ Mather …
dense plasma focus device. The conventional hollow copper anode of the 3.3 kJ Mather …
Research with plasma foci in countries of Asia, Africa, and Latin America
AE Dubinov, EI Fomicheva, LA Senilov - Reviews of Modern Plasma …, 2020 - Springer
This paper considers the modern level of technique, research, and application of “plasma
focus” facilities in the countries of Asia, Africa, and Latin America. A description of the …
focus” facilities in the countries of Asia, Africa, and Latin America. A description of the …
Plasma focus as a possible x-ray source for radiography
A study of x-ray emission from a low energy (1.8 kJ) plasma focus (PF) device powered by a
9 µF capacitor bank, charged at 20 kV and giving peak discharge current of about 175 kA by …
9 µF capacitor bank, charged at 20 kV and giving peak discharge current of about 175 kA by …
Effect of energetic ion irradiation on CdI2 films
CdI2 has a layered structure with neighboring layers held by van der Waals forces. Different
stacking sequences of iodine, sandwiching Cd layers, give rise to polytype structures. As …
stacking sequences of iodine, sandwiching Cd layers, give rise to polytype structures. As …
Synthesis of nanocrystalline multiphase titanium oxycarbide (TiCxOy) thin films by UNU/ICTP and NX2 plasma focus devices
Nanocrystalline multiphase titanium oxycarbide (TiC x O y) thin films composed of TiC 2, TiO
0.325, Ti 2 O 3 and graphitic carbon have been deposited on titanium substrates, using …
0.325, Ti 2 O 3 and graphitic carbon have been deposited on titanium substrates, using …
Nitriding of titanium by using an ion beam delivered by a plasma focus
The room temperature nitriding of titanium is accomplished by utilizing nitrogen ion beams
delivered by a 2.3 kJ plasma focus discharge. Titanium samples are exposed to ions at …
delivered by a 2.3 kJ plasma focus discharge. Titanium samples are exposed to ions at …
Deposition of zirconium carbonitride composite films using ion and electron beams emitted from plasma focus device
Nanocrystalline zirconium carbonitride (ZrCN) composite films were deposited on zirconium
substrates for multiple (10, 20, 30, 40 and 50) focus shots. X-ray diffraction analysis shows …
substrates for multiple (10, 20, 30, 40 and 50) focus shots. X-ray diffraction analysis shows …
Nano-phase titanium dioxide thin film deposited by repetitive plasma focus: Ion irradiation and annealing based phase transformation and agglomeration
We report the successful deposition of nano-phase crystalline titanium dioxide (TiO2) thin
films using a repetitive plasma focus device on silicon (Si) substrates at room temperature …
films using a repetitive plasma focus device on silicon (Si) substrates at room temperature …
Nitrogen ion implantation of silicon in dense plasma focus
A low energy (1.45 kJ) Mather type plasma focus device is used for nitrogen ion implantation
in mono-crystalline silicon. The silicon specimens are exposed to different number of focus …
in mono-crystalline silicon. The silicon specimens are exposed to different number of focus …