Methods for the fabrication of thin films with well controlled structure and properties are of
great importance for the development of functional devices for a large range of applications …

In this study, copper (II) oxide thin-film samples were fabricated by the SILAR technique in
the absence and presence of surfactant as a capping agent. The obtained CuO structures …

This study aimed to evaluate the effect of SILAR coating parameters on the surface
roughness of ZnO thin films with a chemometric approach and to develop a mathematical …

Successive ionic layer adsorption and reaction (SILAR) method were used to synthesize of
cadmium sulfide (CdS) thin films on support material under different synthesis conditions …

A mathematical prediction model was developed to predict the band gap of Sb 2 S 3 films
based on the synthesis parameters. For the optimization of process parameters, a …

Nanostructured CdO films were prepared on glass substrates by a surfactant–sodium
dodecyl sulfate (SDS)–assisted SILAR technique. The influence of SDS concentrations of …

In this study, important process parameters in the synthesis of PbS films using a continuous
flow reactor were optimized with a design of experiments approach. Flow rate, circulation …

In this paper, SnS films were deposited on glass substrates by successive ionic layer
adsorption and reaction method under different deposition conditions. Quality of …

Thin films of the covellite phase of CuS are of special importance due to their properties for
optoelectronic device applications. Their preparation by chemical solution methods could …

Herein, we have investigated the effect of cationic precursor (manganese chloride
tetrahydrate) concentration on the electrochemical performance of successive ionic layer …