Chromium Nitride (CrN) coatings have widespread utilization across numerous industrial
applications, primarily attributed to their excellent properties. Among the different methods …

Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

The angular dependence of the deposition rates due to ions and neutrals in high-power
impulse magnetron sputtering (HiPIMS) discharges with a titanium target were determined …

In this Tutorial, various methods of optical spectroscopy representing certain interest for
magnetron discharge characterization are overviewed. The main principles, the …

The use of high-power impulse magnetron sputtering (HIPIMS) to deposit chromium-based
thin films on brass substrates for the purpose of corrosion-protective coating was …

The pulse length dependence of a reactive high power impulse magnetron sputtering
(HiPIMS) discharge with a tungsten cathode in an argon+ oxygen gas mixture gas was …

Ion acceleration in a bipolar high-power impulse magnetron sputtering discharge working
with Ar gas and using a Ti cathode has been investigated. The multiple discharge diagnostic …

In magnetron sputtering, only a fraction of the sputtered target material leaving the ionization
region is directed toward the substrate. This fraction may be different for ions and neutrals of …

Magnetron sputtering discharges feature complex magnetic field configurations to confine
the electrons close to the cathode surface. This magnetic field configuration gives rise to a …

As a highly recommended approach, the atomic layer deposition (ALD) is widely applied to
prepare the nanoscale thin films. To enable the development of ALD in high-quality films …