The ionization data of a neutral molecule are crucial to model the energy deposition and dissociative ionization process. We study theoretically the electron impact ionization process …
L Song, F Yang, BC Bostick, H Du, Y Dai, C Li, J Sun… - Talanta, 2024 - Elsevier
Tungsten is an emerging environmental pollutant. However, a proved robust method for preserving and determining the concentrations of tungsten in environmental media is still …
JJ Lutz, DS Jensen, JA Hubbard - The Journal of Chemical Physics, 2023 - pubs.aip.org
Metal hexafluorides hydrolyze at ambient temperature to deposit compounds having fluorine- to-oxygen ratios that depend upon the identity of the metal. Uranium-hexafluoride hydrolysis …
L Fadillah, K Takase, H Kobayashi… - Electrochimica …, 2019 - Elsevier
The effect of alloying of sputter-deposited Fe with 9 at.% tungsten on the growth of nanoporous anodic oxide was studied in ethylene glycol electrolyte containing 0.1 mol dm …
Currently, the process of determining the enrichment levels of uranium for enrichment processing plant is a long and involved process, requiring samples to be collected, shipped …
Through the process of chemical vapor deposition, Tungsten Hexafluoride (WF6) is widely used by the semiconductor industry to form tungsten films. Tungsten Hexafluoride (WF6) is …
SY Son, YM Kim, DH Choi - Korean Journal of Materials Research, 2021 - koreascience.kr
Through the process of chemical vapor deposition, Tungsten Hexafluoride (WF 6) is widely used by the semiconductor industry to form tungsten films. Tungsten Hexafluoride (WF 6) is …