Metal mesh-based special wettability materials for oil-water separation: A review of the recent development

M Zhu, Y Liu, M Chen, Z Xu, L Li, Y Zhou - Journal of Petroleum Science …, 2021 - Elsevier
Special wettability material is an important material for oily wastewater treatment. Among
various wettability materials, the metal mesh material showed great advantages, such as …

Structuring of Si into multiple scales by metal‐assisted chemical etching

RP Srivastava, DY Khang - Advanced Materials, 2021 - Wiley Online Library
Structuring Si, ranging from nanoscale to macroscale feature dimensions, is essential for
many applications. Metal‐assisted chemical etching (MaCE) has been developed as a …

Wet etch, dry etch, and MacEtch of β-Ga2O3: A review of characteristics and mechanism

HC Huang, Z Ren, C Chan, X Li - Journal of Materials Research, 2021 - Springer
Abstract β-Ga 2 O 3, a promising ultra-wide bandgap material for future high-power
electronics and deep-ultraviolet optoelectronics applications, has drawn tremendous …

[HTML][HTML] Programmable vapor-phase metal-assisted chemical etching for versatile high-aspect ratio silicon nanomanufacturing

LL Janavicius, JA Michaels, C Chan… - Applied Physics …, 2023 - pubs.aip.org
Defying the isotropic nature of traditional chemical etch, metal-assisted chemical etching
(MacEtch) has allowed spatially defined anisotropic etching by using patterned metal …

Deterministic light yield, fast scintillation, and microcolumn structures in lead halide perovskite nanocrystals

F Maddalena, A Xie, XY Chin, R Begum… - The Journal of …, 2021 - ACS Publications
Lead halide perovskite (LHP) nanocrystals (NCs) have recently attracted attention due to
both their high quantum yield and their potential for X-ray imaging applications. In this paper …

Direct chemisorption-assisted nanotransfer printing with wafer-scale uniformity and controllability

ZJ Zhao, SH Shin, SY Lee, B Son, Y Liao, S Hwang… - ACS …, 2022 - ACS Publications
Nanotransfer printing techniques have attracted significant attention due to their outstanding
simplicity, cost-effectiveness, and high throughput. However, conventional methods via a …

Low dimensional freestanding semiconductors for flexible optoelectronics: materials, synthesis, process, and applications

JH Seo, E Swinnich, YY Zhang… - Materials Research Letters, 2020 - Taylor & Francis
In this review, the primary focus is the recent advances in the development of freestanding
inorganic crystalline semiconductors and their manipulation technology for flexible …

[HTML][HTML] High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch

Z Shi, K Jefimovs, M Stampanoni, L Romano - Materials Science in …, 2023 - Elsevier
Structuring Si in arrays of vertical high aspect ratio pillars, ranging from nanoscale to
macroscale feature dimensions, is essential for producing functional interfaces for many …

Ruthenium-assisted chemical etching of silicon: Enabling CMOS-compatible 3D semiconductor device nanofabrication

A Mallavarapu, P Ajay, C Barrera… - ACS Applied Materials …, 2020 - ACS Publications
The semiconductor industry's transition to three-dimensional (3D) logic and memory devices
has revealed the limitations of plasma etching in reliable creation of vertical high aspect ratio …

[HTML][HTML] Deep-reactive ion etching of silicon nanowire arrays at cryogenic temperatures

J Xu, AD Refino, A Delvallée, S Seibert… - Applied Physics …, 2024 - pubs.aip.org
The pursuit of sculpting materials at increasingly smaller and deeper scales remains a
persistent subject in the field of micro-and nanofabrication. Anisotropic deep-reactive ion …