As foreseen by Keyes in the late 1960s, the self-heating effect has emerged as an important concern for device performance, output power density, run-time variability, and reliability of …
L Cai, W Chen, G Du, X Zhang… - IEEE Transactions on …, 2018 - ieeexplore.ieee.org
With technology node scaling down to 5 nm, the narrow device geometry confines the material thermal conductivity and further aggravates the self-heating effect in gate-all-around …
Computer-aided design (CAD) tools traditionally optimize for power, performance, and area (PPA). However, given a vast number of hardware security threats, we call for secure-by …
J Jeong, DM Geum, SH Kim - Electronics, 2022 - mdpi.com
For next-generation system-on-chips (SoCs) in diverse applications (RF, sensor, display, etc.) which require high-performance, small form factors, and low power consumption …
R Liu, X Li, Y Sun, Y Shi - IEEE Transactions on Electron …, 2020 - ieeexplore.ieee.org
In this article, the impact of self-heating effect (SHE) on nanosheet gate-all-around (GAA) transistor with a vertical combo spacer and different underlap/overlap channels is studied by …
A Gupta, C Gupta, RA Vega, TB Hook… - IEEE Transactions on …, 2019 - ieeexplore.ieee.org
A comprehensive study on hot-carrier degradation (HCD) mechanisms in 14 nm silicon-on- insulator (SOI) n-channel FinFETs is presented. The impact of high-frequency AC stress bias …
The evolution of transistor topology from planar to confined geometry transistors (ie, FinFET, Nanowire FET, Nanosheet FET) has met the desired performance specification of sub-20 nm …
Till date, the existing understanding of negative differential resistance (NDR) is obtained from metal-ferro–metal–insulator–semiconductor (MFMIS) FET, and it has been utilized for …
The self-heating effects (SHEs) in gate-all-around (GAA) MOSFETs with vertically stacked silicon nanowire (SiNW) channels are investigated. Direct observations using thermal …