Advancements in optical lithography tools, processes, and patterning materials have been
critical to the continued performance increases of semiconductor devices as well as to the …

, 要浸没式% 刻机是目前在45 nm 以ß IC 生产线Þ 唯Ô 获得应用的新% 刻装备浸没控制系统是
浸没式% 刻机的核心e 系统之Ô 用于在最后Ô 片投影物镜和硅片之间提供并维持具有高度洁净 …

One of the major concerns in the emerging technology of liquid immersion lithography is the
possibility of defects due to bubble formation in the immersion liquid. We have performed …

The filling of an oval disk-shaped micro-chamber by liquid is analyzed with reference to
micro-systems with inlets and outlets of various widths, which are fabricated using MEMS …

Immersion lithography has been proposed as a method for improving optical lithography
resolution to 50 nm and below. The premise behind the concept is to increase the refraction …

Liquid renovation is perhaps the best method to reduce contamination in immersion
lithography, but it brings lens distortion because of the high density and viscosity of the …

Immersion lithography machine is the only new equipment used at present for the IC
production line below 45 nm. Immersion control system is one of the key components of …

The viability of fluid management in immersion lithography for laser mask writing is
demonstrated. The so-called “drag-a-drop” method is proposed, where a droplet of fluid is …

An analysis of the liquid filling processes in an oval disk-shaped micro chamber is
demonstrated while associated with the micro systems at various widths of inlet and outlet …

The important roles of fluid dynamics in immersion lithography (IL) and step-and-flash
imprint lithography (S-FIL) are analyzed experimentally and theoretically. In IL there are …