TiAlN single layer coatings deposited by High-Power Impulse Magnetron Sputtering
(HiPIMS) on carbide and Si-wafers substrates were performed. They were characterized in …

For several decades, the increasing productivity in many industrial domains has led to a
significant and ever-increased interest to protective and hard coatings. In this context …

PVD technologies, including vacuum arc evaporation and DC-magnetron sputtering, have
been utilized in industrial settings since the early 1980s for depositing protective coatings …

Reactive high-power impulse magnetron sputtering (R-HiPIMS) is seen as a key-technology
for the deposition of future hard and multifunctional coatings. Increased ionisation rates …

With the integration of 5G in day-to-day devices and the foreseeable 6G revolution, demand
for advanced radio frequency (RF) microelectromechanical systems (MEMS) is growing …

It has been reported that compared to state-of-the-art technologies, High Power Impulse
Magnetron Sputtering produces very dense and droplet free coatings due to the high plasma …

Substrate bias voltage is one of the most influential deposition parameter for physical vapour
deposition processes as it can directly control the adatom mobility during coating growth. It …

Ti-TiO2 bilayer thin films were successfully prepared onto a glass substrate using magnetron
sputtering with different TiO2 bottom layer conditions. These represent a lack of (as …

Herein, the deposition of titanium films on complex bowl-shaped workpieces was conducted
using direct-current magnetron sputtering (DCMS) and high-power impulse magnetron …

To comprehend the correlation between HiPIMS plasma characteristic and mechanical
properties of TiAlN films, the present research investigated the influence of amplitude and …