AUTOMATION OF THE POLYCRYSTALLINE SILICON SURFACE FORMATION CONTROL PROCESS
І Nevlyudov, S Tesliuk - International Independent Scientific Journal, 2021 - elibrary.ru
In the article the process of control of polycrystalline silicon surface formation is researched.
It is proposed to use the thickness control method for the semiconductor wafer in the …
It is proposed to use the thickness control method for the semiconductor wafer in the …