Solderless bonding with nanoporous copper as interlayer for high-temperature applications

S Sun, Q Guo, H Chen, M Li, C Wang - Microelectronics Reliability, 2018 - Elsevier
Abstract The Cu 40 Al 60 alloy has been developed as the precursor alloy to fabricate
nanoporous copper (NPC) sheets through chemical dealloying in 1.6 mol/L dilute …

Copper Nanoparticle Sintering Enabled Hermetic Packaging With Fine Sealing Ring for MEMS Application

D Hu, MB Shah, J Fan, S Vollebregt… - IEEE Transactions on …, 2023 - ieeexplore.ieee.org
Driving by the increased demand for hermetic packaging in the more than Moore (MtM)
roadmap, a Cu nanoparticle sintering-enabled hermetic sealing solution was developed …

Low Temperature Sapphire to Silicon Flip Chip Interconnects by Copper Nanoparticle Sintering

X Ji, H Van Zeijl, J Romijn… - 2022 IEEE 9th …, 2022 - ieeexplore.ieee.org
The continuous trend to integrate more multi-functions in a package often involves,
Heterogeneous Integration of multi-functional blocks in some kind of 3D stacking. The …

Mechanistic Understanding of Sintered Nano Copper Based Joints

S Thekkut - 2022 - search.proquest.com
Conventional microelectronic interconnections are made using solder alloys, but the
demand for high performance interconnects is ever-increasing to meet challenges of …

Simulation and Verification or Cu@ Ag Core-shell Sintered Paste for Power Semiconductor Die-attach Applications

X Wang, Z Zeng, J Zhang, G Zhang… - 2022 IEEE 72nd …, 2022 - ieeexplore.ieee.org
With the increasing application of wide bandgap materials such as silicon carbide and
gallium nitride in power devices, the working temperature of power devices has been …

Development and characterizations of fine pitch flip-chip interconnection using silver sintering

J Gougeon, C Feautrier, JC Souriau… - 2023 24th European …, 2023 - ieeexplore.ieee.org
Flip-chip interconnects made of silver are promising candidates to overcome the intrinsic
limits of solder-based interconnects and match the demand for increased current densities of …

Patterning of fine-features in nanoporous films synthesized by spark ablation

X Ji, HJ van Ginkel, D Hu, A Schmidt-Ott… - 2022 IEEE 22nd …, 2022 - ieeexplore.ieee.org
Advances in semiconductor device manufacturing technologies are enabled by the
development and application of novel materials. Especially one class of materials …

[HTML][HTML] 温度和频率对互连线信号完整性的影响

魏建军, 王振源, 陈付龙, 刘乃安, 李晓辉, 韦娟 - 哈尔滨工程大学学报, 2019 - html.rhhz.net
针对VLSI 中的互连线信号完整性问题, 研究温度和频率对电阻, 电感和电容的影响.
在温度和频率的作用下, 采用多节RLC 模型, 分别探讨温度和频率对互连线电学特性的影响 …

All-copper interconnects for high-temperature applications

A Sharif - … and Performance Assessment; Wiley: Hoboken, NJ …, 2019 - books.google.com
The joining materials for high-temperature electronics must survive in very severe thermal
environments that are not usually experienced by conventional Si devices [1]. The joint must …

MEMS enabled fast time-resolved X-ray diffraction characterization platform for copper nanoparticle sintering in heterogeneous integration applications

B Zhang, J Wei, AJ Böttger, HW van Zeijl… - … Conference on Solid …, 2019 - ieeexplore.ieee.org
We report the design, fabrication and experimental investigation of a MEMS micro-hotplate
(MHP) for fast time-resolved X-ray diffraction (TRXRD) study of Cu nanoparticle paste …