The influence of energetic species on thin film growth mechanism is a long-term issue in the
field of low-pressure plasma-based magnetron sputtering technology. Several species may …

This work critically reviews the evolution of reactive sputtering modeling that has taken place
over the last 50 years. The review summarizes the main features of the deposition of simple …

The paper focuses on measurements of the total energy flux and normalized energy flux
onto the substrate during high power impulse magnetron sputtering (HiPIMS) in a wide …

Of prime prominence in modification of growing films in magnetron sputtering is the energy
of arriving species onto the substrate; however, the effect of discharge voltage on such an …

The present work studies thermal processes in DC magnetron sputtering units. A unit with a
single hot titanium target is used to deposit films of titanium and titanium nitride. Another …

In this work, the energetic conditions at the substrate were investigated in dc magnetron
sputtering (DCMS), pulsed dc magnetron sputtering (pDCMS), and high power impulse …

In this article, energy flux measurements at the substrate location are reported. In particular,
the energy flux related to IR radiation emanating from the titanium (10 cm in diam.) target …

The present work aims to develop the method for indirect determination of the magnetron
target temperature. This method is based on the measurements of heating kinetic curves of …

The characterization of energy influxes from plasma to substrate during sputter deposition of
ZnO films is presented and discussed. Measurements were carried out in a triple rf …

Heating and cooling processes of the substrate during the DC magnetron sputtering of the
copper target were investigated. The sensitive element of a thermocouple was used as a …