[HTML][HTML] Coordination and organometallic precursors of group 10 and 11: Focused electron beam induced deposition of metals and insight gained from chemical …
Nanostructured materials made from group 10 (Ni, Pd, Pt) and group 11 (Cu, Ag, Au)
elements have outstanding technological relevance in microelectronics, nano-optics …
elements have outstanding technological relevance in microelectronics, nano-optics …
Atomic layer deposition of metals: Precursors and film growth
DJ Hagen, ME Pemble, M Karppinen - Applied Physics Reviews, 2019 - pubs.aip.org
The coating of complex three-dimensional structures with ultrathin metal films is of great
interest for current technical applications, particularly in microelectronics, as well as for basic …
interest for current technical applications, particularly in microelectronics, as well as for basic …
Area-selective deposition: fundamentals, applications, and future outlook
GN Parsons, RD Clark - Chemistry of Materials, 2020 - ACS Publications
This review provides an overview of area-selective thin film deposition (ASD) with a primary
focus on vapor-phase thin film formation via chemical vapor deposition (CVD) and atomic …
focus on vapor-phase thin film formation via chemical vapor deposition (CVD) and atomic …
Understanding chemical and physical mechanisms in atomic layer deposition
Atomic layer deposition (ALD) is a powerful tool for achieving atomic level control in the
deposition of thin films. However, several physical and chemical phenomena can occur …
deposition of thin films. However, several physical and chemical phenomena can occur …
[HTML][HTML] Functional model for analysis of ALD nucleation and quantification of area-selective deposition
GN Parsons - Journal of Vacuum Science & Technology A, 2019 - pubs.aip.org
Bottom-up chemical patterning, to additively form material only in desired locations, is
becoming important to address scaling issues in semiconductor device manufacturing …
becoming important to address scaling issues in semiconductor device manufacturing …
Synthesis of biosurfactant stabilized silver nanoparticles, characterization and their potential application for bactericidal purposes
Uniformly dispersed silver nanoparticles (AgNPs) with remarkable colloidal stability were
synthesised using chemical reduction method in lipopeptide biosurfactant reverse micelles …
synthesised using chemical reduction method in lipopeptide biosurfactant reverse micelles …
Emerging Single‐Atom Catalysts/Nanozymes for Catalytic Biomedical Applications
Single‐atom catalysts (SACs) are a type of atomically dispersed nanozymes with the highest
atom utilization, which employ low‐coordinated single atoms as the catalytically active sites …
atom utilization, which employ low‐coordinated single atoms as the catalytically active sites …
Atomic layer deposition of 2D metal dichalcogenides for electronics, catalysis, energy storage, and beyond
M Mattinen, M Leskelä, M Ritala - Advanced Materials …, 2021 - Wiley Online Library
Abstract 2D transition metal dichalcogenides (TMDCs) are among the most exciting
materials of today. Their layered crystal structures result in unique and useful electronic …
materials of today. Their layered crystal structures result in unique and useful electronic …
Atomic layer deposition of thin films: from a chemistry perspective
J Li, G Chai, X Wang - International Journal of Extreme …, 2023 - iopscience.iop.org
Atomic layer deposition (ALD) has become an indispensable thin-film technology in the
contemporary microelectronics industry. The unique self-limited layer-by-layer growth …
contemporary microelectronics industry. The unique self-limited layer-by-layer growth …
[HTML][HTML] Direct atomic layer deposition of ultra-thin Al2O3 and HfO2 films on gold-supported monolayer MoS2
In this paper, the atomic layer deposition (ALD) of ultra-thin films (< 4 nm) of Al 2 O 3 and
HfO 2 on gold-supported monolayer (1L) MoS 2 is investigated, providing an insight on the …
HfO 2 on gold-supported monolayer (1L) MoS 2 is investigated, providing an insight on the …