Abstract Two‐dimensional (2D) nanosheets, which possess atomic or molecular thickness
and infinite planar lengths, are regarded as the thinnest functional nanomaterials. The …

Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Reversible photo‐induced performance deterioration is observed in mesoporous TiO2‐
containing devices in an inert environment. This phenomenon is correlated with the …

Atomic layer deposition (ALD) is a thin film technology that in the past two decades rapidly
developed from a niche technology to an established method. It proved to be a key …

This review article summarized the recent understanding of resistance switching (RS)
behavior in several binary oxide thin film systems. Among the various RS materials and …

In the present hyper-scaling era, memory technology is advancing owing to the demand for
high-performance computing and storage devices. As a result, continuous work on …

This article reviews the status, the challenges, and the perspective of 1T-1C dynamic
random access memory (DRAM) chip. The basic principles of the DRAM are presented …

Within its rich phase diagram titanium dioxide is a truly multifunctional material with a
property palette that has been shown to span from dielectric to transparent-conducting …

257 holes, 86 Catalyst, 39, 254 Cell cell architecture, 77, 79, 80 cell size, 8, 74, 76, 80, 83,
126, 127, 149, 154 matrix-type cell, 83 Channel channel doping concentration, 88 channel …

Challenges in scaling of semiconductor memory technologies are reviewed with the focus
on DRAM and NAND Flash while demands for memory improvement in the ICT industry are …