Recent developments in materials, architectures and processing of AlGaN/GaN HEMTs for future RF and power electronic applications: A critical review

B Mounika, J Ajayan, S Bhattacharya, D Nirmal - Micro and Nanostructures, 2022 - Elsevier
This article critically reviews the architectural novelties, emerging materials (substrate,
buffer, barrier & contact materials), technological advancements, processing techniques …

[HTML][HTML] A perspective on the electro-thermal co-design of ultra-wide bandgap lateral devices

S Choi, S Graham, S Chowdhury, ER Heller… - Applied Physics …, 2021 - pubs.aip.org
Fundamental research and development of ultra-wide bandgap (UWBG) semiconductor
devices are under way to realize next-generation power conversion and wireless …

500° C operation of β-Ga2O3 field-effect transistors

AE Islam, NP Sepelak, KJ Liddy, R Kahler… - Applied Physics …, 2022 - pubs.aip.org
We demonstrated 500 C operation of field-effect transistors made using ultra-wide bandgap
semiconductor β-Ga 2 O 3. Metal–semiconductor field-effect transistors were fabricated …

Overview of wide/ultrawide bandgap power semiconductor devices for distributed energy resources

SK Mazumder, LF Voss, KM Dowling… - IEEE Journal of …, 2023 - ieeexplore.ieee.org
This article provides an overview of power semiconductor devices (PSDs) for the distributed
energy resource (DER) system. To begin with, an overview of electrically triggered silicon …

[HTML][HTML] Multidimensional thermal analysis of an ultrawide bandgap AlGaN channel high electron mobility transistor

JS Lundh, B Chatterjee, Y Song, AG Baca… - Applied Physics …, 2019 - pubs.aip.org
Improvements in radio frequency and power electronics can potentially be realized with
ultrawide bandgap materials such as aluminum gallium nitride (Al x Ga 1− x N) …

Simulation Research on Single Event Burnout Performances of p-GaN Gate HEMTs With 2DEG AlxGa1-xN Channel

S Liu, J Zhang, S Zhao, L Shu, X Song… - … on Electron Devices, 2022 - ieeexplore.ieee.org
In this article, the single event burnout (SEB) performances for 2DEG Al x channel p-GaN
gate high electron mobility transistors (HEMTs) have been investigated comprehensively to …

[HTML][HTML] Thermally hardened AlGaN/GaN MIS-HEMTs based on multilayer dielectrics and silicon nitride passivation

H Lee, H Ryu, W Zhu - Applied Physics Letters, 2023 - pubs.aip.org
AlGaN/GaN metal–insulator–semiconductor high-electron-mobility transistors (MIS-HEMTs)
were demonstrated to operate at temperatures of up to 600 C. High-quality multilayer gate …

AlN/GaN superlattice channel HEMTs on silicon substrate

S Liu, W Zhang, J Zhang, X Song, Y Wu… - … on Electron Devices, 2021 - ieeexplore.ieee.org
High-electron-mobility transistor (HEMT) with AlN/GaN superlattice (SL) channel has been
demonstrated on a silicon substrate. High OFF-state breakdown voltage V BR of 670 V (gate …

Chip-last (RDL-first) fan-out panel-level packaging (FOPLP) for heterogeneous integration

JH Lau, CT Ko, CY Peng, KM Yang… - Journal of …, 2020 - meridian.allenpress.com
In this investigation, the chip-last, redistribution-layer (RDL)–first, fan-out panel-level
packaging (FOPLP) for heterogeneous integration is studied. Emphasis is placed on the …

Extreme temperature operation of ultra-wide bandgap AlGaN high electron mobility transistors

PH Carey, F Ren, AG Baca, BA Klein… - IEEE Transactions …, 2019 - ieeexplore.ieee.org
High Aluminum content channel (Al 0.85 Ga 0.15 N/Al 0.7 Ga 0.3 N) High Electron Mobility
Transistors (HEMTs) were operated from room temperature to 500° C in ambient. The …