Enhanced Resistive Switching in Flexible Hybrid RRAM Devices With PVK:MoS2/TiO2 Bilayer
High-performance flexible resistive random access memory (RRAM) devices were
demonstrated by engineering the switching layer with PVK: MoS2 composite and TiO2 …
demonstrated by engineering the switching layer with PVK: MoS2 composite and TiO2 …
A direct Z-scheme MoS2/NH2-MIL-68 (In)-derived In2S3 photocatalyst for efficient photocatalytic reduction of Cr (VI) under visible-light irradiation
C Yan, X Dong, Y Wang, N Zheng, H Ma… - Journal of Water Process …, 2023 - Elsevier
Inorganic semiconductors prepared from MOFs as sacrificial precursors are promising
photocatalytic materials. In this work, the direct Z-scheme MoS 2/NH 2-MIL-68 (In)-derived In …
photocatalytic materials. In this work, the direct Z-scheme MoS 2/NH 2-MIL-68 (In)-derived In …
Surface reaction mechanism of atomic layer deposition of niobium oxide: In situ characterization and first-principle study
K Khumaini, H Roh, H Han, HL Kim, HS Kim… - Applied Surface …, 2023 - Elsevier
We report the surface reaction mechanism of the atomic layer deposition (ALD) of niobium
oxide films by combining experimental and theoretical studies. Tert-butylimido tris …
oxide films by combining experimental and theoretical studies. Tert-butylimido tris …
[HTML][HTML] A general and facile approach to flower-like ZnO fabrication
HS Jang, GH Jeong, HJ Lee, HS Shin, Y Hwa… - Materials Today …, 2023 - Elsevier
ZnO nanosheets with nanograin distributions, high mesoporosity, and ultrathin thickness
have garnered considerable attention owing to their intriguing properties, such as high …
have garnered considerable attention owing to their intriguing properties, such as high …
A theoretical study on the surface reaction of tetrakis (dimethylamino) titanium on titanium oxide
Tetrakis (dimethylamino)-titanium (TDMAT, Ti (NMe2) 4) has been used for the low-
temperature atomic layer deposition (ALD) process of titanium oxide (TiO2) films. In this …
temperature atomic layer deposition (ALD) process of titanium oxide (TiO2) films. In this …
Atomic-scale study of TiO 2-GR nanohybrid formation by ALD: the effect of the gas phase precursor
JE Rodríguez-Hueso, HA Borbón-Nuñez… - Nanoscale …, 2023 - pubs.rsc.org
In the present work, we report on a theoretical-computational study of the growth mechanism
of the TiO2-Graphene nanohybrid by atomic layer deposition. Hydroxyl groups (OH) are …
of the TiO2-Graphene nanohybrid by atomic layer deposition. Hydroxyl groups (OH) are …
Comparison of H2O2 and H2O oxidations on TDMAT absorbed on silicon (100) surface during reaction step of ALD–TiO2 process: A DFT study
Atomic layer deposition (ALD) is a thin film technology with high potential in nano
fabrication. There is industrial demand to produce an ALD–TiO 2 thin film using a low …
fabrication. There is industrial demand to produce an ALD–TiO 2 thin film using a low …
Density functional theory study of adsorption pathways of TiCl4 on Polyether Ether Ketone
In this study, a theoretical evaluation was conducted on the adsorption pathway of TiCl 4 on
PEEK at room temperature (298 K) and pressure (101325 Pa). The thermodynamics of the …
PEEK at room temperature (298 K) and pressure (101325 Pa). The thermodynamics of the …
Synthesis of TiO2-modified Fischer-Tropsh catalysts by Atomic Layer Deposition
R Soler Martín - 2024 - diposit.ub.edu
The Fischer-Tropsch Synthesis (FTS) is a process that forms hydrocarbon chains from CO
and H2. In this work, catalysts for the FTS are synthesized. These catalysts consist of an …
and H2. In this work, catalysts for the FTS are synthesized. These catalysts consist of an …