Kinetic Monte Carlo simulation for semiconductor processing: A review

I Martin-Bragado, R Borges, JP Balbuena… - Progress in Materials …, 2018 - Elsevier
Abstract The Kinetic Monte Carlo (KMC) algorithm is a particularly apt technique to simulate
the complex processing of semiconductor devices. In this review, some of the main …

[图书][B] Intrinsic point defects, impurities, and their diffusion in silicon

P Pichler - 2012 - books.google.com
Basically all properties of semiconductor devices are influenced by the distribution of point
defects in their active areas. This book contains the first comprehensive review of the …

Intrinsic and extrinsic diffusion of phosphorus, arsenic, and antimony in germanium

S Brotzmann, H Bracht - Journal of Applied Physics, 2008 - pubs.aip.org
Diffusion experiments of phosphorus (P), arsenic (As), and antimony (Sb) in high purity
germanium (Ge) were performed at temperatures between 600 and 920 C⁠. Secondary ion …

Complex dynamical phenomena in heavily arsenic doped silicon

M Ramamoorthy, ST Pantelides - Physical review letters, 1996 - APS
Several complex dynamical phenomena have been observed in heavily doped Si, but a
comprehensive account of the underlying atomic-scale processes is lacking. We report a …

Self-and foreign-atom diffusion in semiconductor isotope heterostructures. II. Experimental results for silicon

H Bracht, HH Silvestri, ID Sharp, EE Haller - Physical Review B—Condensed …, 2007 - APS
We report the diffusion of boron, arsenic, and phosphorus in silicon isotope multilayer
structures at temperatures between 850° C and 1100° C. The diffusion of all dopants and …

An energy basin finding algorithm for kinetic Monte Carlo acceleration

B Puchala, ML Falk, K Garikipati - The Journal of chemical physics, 2010 - pubs.aip.org
We present an energy basin finding algorithm for identifying the states in absorbing Markov
chains used for accelerating kinetic Monte Carlo (KMC) simulations out of trapping energy …

Vacancy-mediated dopant diffusion activation enthalpies for germanium

A Chroneos, H Bracht, RW Grimes… - Applied Physics …, 2008 - pubs.aip.org
Electronic structure calculations are used to predict the activation enthalpies of diffusion for a
range of impurity atoms (aluminium, gallium, indium, silicon, tin, phosphorus, arsenic, and …

Diffusion and defect reactions between donors, C, and vacancies in Ge. I. Experimental results

S Brotzmann, H Bracht, JL Hansen, AN Larsen… - Physical Review B …, 2008 - APS
The diffusion of self-atoms and n-type dopants such as phosphorus, arsenic, and antimony
in germanium was studied by means of isotopically controlled multilayer structures doped …

[HTML][HTML] Genesis and evolution of extended defects: The role of evolving interface instabilities in cubic SiC

G Fisicaro, C Bongiorno, I Deretzis… - Applied Physics …, 2020 - pubs.aip.org
Emerging wide bandgap semiconductor devices such as the ones built with SiC have the
potential to revolutionize the power electronics industry through faster switching speeds …

[图书][B] Charged semiconductor defects: structure, thermodynamics and diffusion

EG Seebauer, MC Kratzer - 2008 - books.google.com
Defects in semiconductors have been studied for many years, in many cases with a view
toward controlling their behaviour through various forms of “defect engineering”. For …