Basically all properties of semiconductor devices are influenced by the distribution of point defects in their active areas. This book contains the first comprehensive review of the …
S Brotzmann, H Bracht - Journal of Applied Physics, 2008 - pubs.aip.org
Diffusion experiments of phosphorus (P), arsenic (As), and antimony (Sb) in high purity germanium (Ge) were performed at temperatures between 600 and 920 C. Secondary ion …
M Ramamoorthy, ST Pantelides - Physical review letters, 1996 - APS
Several complex dynamical phenomena have been observed in heavily doped Si, but a comprehensive account of the underlying atomic-scale processes is lacking. We report a …
H Bracht, HH Silvestri, ID Sharp, EE Haller - Physical Review B—Condensed …, 2007 - APS
We report the diffusion of boron, arsenic, and phosphorus in silicon isotope multilayer structures at temperatures between 850° C and 1100° C. The diffusion of all dopants and …
We present an energy basin finding algorithm for identifying the states in absorbing Markov chains used for accelerating kinetic Monte Carlo (KMC) simulations out of trapping energy …
A Chroneos, H Bracht, RW Grimes… - Applied Physics …, 2008 - pubs.aip.org
Electronic structure calculations are used to predict the activation enthalpies of diffusion for a range of impurity atoms (aluminium, gallium, indium, silicon, tin, phosphorus, arsenic, and …
S Brotzmann, H Bracht, JL Hansen, AN Larsen… - Physical Review B …, 2008 - APS
The diffusion of self-atoms and n-type dopants such as phosphorus, arsenic, and antimony in germanium was studied by means of isotopically controlled multilayer structures doped …
Emerging wide bandgap semiconductor devices such as the ones built with SiC have the potential to revolutionize the power electronics industry through faster switching speeds …
Defects in semiconductors have been studied for many years, in many cases with a view toward controlling their behaviour through various forms of “defect engineering”. For …