Atomic layer deposition of metals: Precursors and film growth

DJ Hagen, ME Pemble, M Karppinen - Applied Physics Reviews, 2019 - pubs.aip.org
The coating of complex three-dimensional structures with ultrathin metal films is of great
interest for current technical applications, particularly in microelectronics, as well as for basic …

Principles of precursor design for vapour deposition methods

SE Koponen, PG Gordon, ST Barry - Polyhedron, 2016 - Elsevier
Chemical vapour deposition (CVD) and atomic layer deposition (ALD) are attractive
techniques for depositing a wide spectrum of thin solid film materials, for a broad spectrum of …

Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-heterocyclic carbene precursor

JP Coyle, G Dey, ER Sirianni, ML Kemell… - Chemistry of …, 2013 - ACS Publications
Two novel N-heterocyclic carbene (NHC)-containing copper (I) amides are reported as
atomic layer deposition (ALD) precursors. 1, 3-Diisopropyl-imidazolin-2-ylidene copper …

Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)2 and Tertiary Butyl Hydrazine

K Väyrynen, K Mizohata, J Räisänen… - Chemistry of …, 2017 - ACS Publications
Herein, we describe a process for the low-temperature atomic layer deposition of copper
using Cu (dmap) 2 (dmap= dimethylamino-2-propoxide). The use of tertiary butyl hydrazine …

Atomic layer deposition of copper nitride film and its application to copper seed layer for electrodeposition

JM Park, K Jin, B Han, MJ Kim, J Jung, JJ Kim, WJ Lee - Thin Solid Films, 2014 - Elsevier
We report the formation of smooth and conformal copper seed layer for electrodeposition by
atomic layer deposition (ALD) and reducing anneal of a copper nitride film. The ALD copper …

Metallic materials deposition: metal‐organic precursors

CH Winter, TJ Knisley, LC Kalutarage… - … of Inorganic and …, 2011 - Wiley Online Library
This review describes metal‐organic precursors for the growth of metal‐containing thin films
by chemical vapor deposition (CVD)‐based methods. The major emphasis is on precursors …

Synthesis, characterization, volatility, and thermal stability of fluorinated copper (II) aminoalkoxide complexes as potential vapour deposition precursors

NA Hoffman, DJH Emslie - Canadian Journal of Chemistry, 2024 - cdnsciencepub.com
The sodium aminoalkoxides Na [OCR (CF3) CH2NMeR′]{R= H, R′= Me (1a); R= R′=
Me (1b); R= CF3, R′= Me (1c); R= Me, R′= Et (1d); R= CF3, R′= Et (1e)} were …

Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides

Y Xiong, GAO Hengjiao, REN Ni… - Plasma Science and …, 2018 - iopscience.iop.org
Copper thin films were deposited by plasma-enhanced atomic layer deposition at low
temperature, using copper (I)-N, N'-di-sec-butylacetamidinate as a precursor and hydrogen …

[HTML][HTML] Atomic Layer Deposition of Late First-Row Transition Metals: Precursors and Processes

K Väyrynen - 2019 - helda.helsinki.fi
Late first-row transition metals, namely copper, nickel, and cobalt, are pivotal materials in
many modern and future applications. Because of its low resistivity, Cu has for long been the …

[图书][B] New chemistry for the growth of first-row transition metal films by atomic layer deposition

JP Klesko - 2015 - search.proquest.com
Thin films containing first-row transition metals are widely used in microelectronic,
photovoltaic, catalytic, and surface-coating applications. In particular, metallic films are …