Capacitively coupled plasmas (CCPs) have been widely used in thin film deposition and
etching in a variety of industries such as those of semi-conductor/microelectronics, flat panel …

In Paper I [Garrigues et al., Phys. Plasmas 31, 073907 (2024)], we have extended the sparse
PIC approach already used in the literature with the offset scheme to reduce the grid-based …

The review considers plasma-processing technologies used in solid-state electronics, both
widely used and ones, which do not found yet industrial applications. Several from them are …

The dependence of electron density and ion flux on radiofrequency (RF) power has been
measured in a 2+ 27 MHz dual-frequency capacitive discharge with silicon electrodes at 6.7 …

We investigate the energy and angular distributions of ions reaching the electrodes in low-
pressure, capacitively coupled oxygen radio-frequency discharges. These distributions, as …

The use of sparse particle-in-cell (PIC) algorithms to accelerate the standard explicit PIC
scheme has recently been successfully applied in the context of single-frequency …

A low-frequency capacitively coupled radio-frequency (rf) discharge in Ar excited at 1.76
MHz is studied both experimentally and theoretically. Experimental measurements of …

The Capacitively Coupled Plasma discharge featuring operation in current driven triple
frequency configuration has analytically been investigated, and the outcome is verified by …

We report experimental and particle-based kinetic simulation studies of low-pressure
capacitively coupled oxygen plasmas driven by tailored voltage waveforms that consist of up …

The plasma dynamics of a low pressure oxygen capacitively coupled plasma driven by dual
frequencies (27.12 MHz and 271.2 kHz) is studied experimentally and numerically in this …