Performance estimation of junctionless multigate transistors

CW Lee, I Ferain, A Afzalian, R Yan, ND Akhavan… - Solid-State …, 2010 - Elsevier
This paper describes the simulation of the electrical characteristics of a new transistor
concept called the “Junctionless Multigate Field-Effect Transistor (MuGFET)”. The proposed …

[HTML][HTML] Comprehensive Review of FinFET Technology: History, Structure, Challenges, Innovations, and Emerging Sensing Applications

K Karimi, A Fardoost, M Javanmard - Micromachines, 2024 - mdpi.com
The surge in demand for 3D MOSFETs, such as FinFETs, driven by recent technological
advances, is explored in this review. FinFETs, positioned as promising alternatives to bulk …

Tri-gate transistor architecture with high-k gate dielectrics, metal gates and strain engineering

J Kavalieros, B Doyle, S Datta, G Dewey… - 2006 Symposium on …, 2006 - ieeexplore.ieee.org
We have combined the benefits of the fully depleted tri-gate transistor architecture with high-
k gate dielectrics, metal gate electrodes and strain engineering. High performance NMOS …

Transport spectroscopy of a single dopant in a gated silicon nanowire

H Sellier, GP Lansbergen, J Caro, S Rogge… - Physical Review Letters, 2006 - APS
We report on spectroscopy of a single dopant atom in silicon by resonant tunneling between
source and drain of a gated nanowire etched from silicon on insulator. The electronic states …

Investigation of silicon nanowire gate-all-around junctionless transistors built on a bulk substrate

DI Moon, SJ Choi, JP Duarte… - IEEE transactions on …, 2013 - ieeexplore.ieee.org
A silicon nanowire (Si-NW) with a gate-all-around (GAA) structure is implemented on a bulk
wafer for a junctionless (JL) field-effect transistor (FET). A suspended Si-NW from the bulk-Si …

Few-electron edge-state quantum dots in a silicon nanowire field-effect transistor

B Voisin, VH Nguyen, J Renard, X Jehl, S Barraud… - Nano …, 2014 - ACS Publications
We investigate the gate-induced onset of few-electron regime through the undoped channel
of a silicon nanowire field-effect transistor. By combining low-temperature transport …

Device design guidelines for nano-scale MuGFETs

CW Lee, CG Yu, JT Park, JP Colinge - Solid-State Electronics, 2007 - Elsevier
The short-channel properties of multi-gate SOI MOSFETs (MuGFETs) are studied by
numerical simulation. The evolution of characteristics such as DIBL, subthreshold slope, and …

On the feasibility of nanoscale triple-gate CMOS transistors

JW Yang, JG Fossum - IEEE Transactions on Electron Devices, 2005 - ieeexplore.ieee.org
The feasibility of triple-gate MOSFETs (TGFETs) for nanoscale CMOS applications is
examined with regard to short-channel effects (SCEs) and gate-layout area. Three …

Fabrication and characterization of gate-all-around silicon nanowires on bulk silicon

V Pott, KE Moselund, D Bouvet… - IEEE transactions on …, 2008 - ieeexplore.ieee.org
This paper reports on the top-down fabrication and electrical performance of silicon
nanowire (SiNW) gate-all-around (GAA) n-type and p-type MOSFET devices integrated on …

High inversion current in silicon nanowire field effect transistors

SM Koo, A Fujiwara, JP Han, EM Vogel, CA Richter… - Nano Letters, 2004 - ACS Publications
Silicon nanowire (SiNW) field effect transistors (FETs) with channel widths down to 20 nm
have been fabricated by a conventional “top-down” approach by using electron-beam …