Physical vapour deposition (PVD) is a well-known technology that is widely used for the
deposition of thin films regarding many demands, namely tribological behaviour …

Due to various difficult-to-machine materials and increasingly severe machining conditions,
more and more attention has been paid to the physical vapor deposition (PVD) technology …

Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

Abstract Bipolar Pulse High Power Impulse Magnetron Sputtering (BP-HiPIMS) was
investigated and used in this work to control the ion bombardment process of growing thin …

The present study aims to demonstrate that operating the HiPIMS discharge in bipolar
regime (BP-HiPIMS) enables an energy-enhanced deposition process of high-quality …

High power impulse magnetron sputtering (HiPIMS) is an ionized physical vapour
deposition technique. While HiPIMS provides a high flux of metal ions to the substrate, the …

PVD technologies, including vacuum arc evaporation and DC-magnetron sputtering, have
been utilized in industrial settings since the early 1980s for depositing protective coatings …

The influence of pulse length, working gas pressure, and peak discharge current density on
the deposition rate and ionised flux fraction in high power impulse magnetron sputtering …

High power impulse magnetron sputtering (HiPIMS) is an ionized physical vapor deposition
technique, providing a high flux of metal ions to the substrate. However, one of the …

In this work, the influence of different pulse widths (25, 50 and 100 μs) during high power
impulse magnetron sputtering (HiPIMS) of copper, silver and zirconium was investigated in …