Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

The ionization of sputtered species in high power impulse magnetron sputtering of titanium,
chromium, and aluminum targets is analyzed using Abel-inverted spectroscopic imaging to …

The magnetic field of a magnetron serves to increase the residence time of electrons in the
ionization region and thereby enables the discharge to be sustained at low working gas …

Three different approaches for using high power impulse magnetron sputtering (HiPIMS)
with a titanium target were examined in terms of plasma diagnostics and coating properties …

We report a systematic nanoscale investigation on the ultrathin Cr film growth process and
properties. Polycrystalline metallic films were manufactured by magnetron sputtering on …

High power impulse magnetron sputtering (HiPIMS) discharges have become an important
tool for the deposition of thin, hard coatings. Such discharges are operated at a very low …

The transport of sputtered species from the target of a magnetron plasma to a collecting
surface at the circumference of the plasma is analyzed using a particle tracer technique. A …

Voltage waveforms generated with the solid-state switches introduce a new form of
insulation stress as compared to the typical waveform of electric generators. In this paper …

Understanding mechanisms behind the formation and propagation of ionisation zones, so-
called spokes, have been highly important since the first observations in high power impulse …

Investigating spokes in high-power impulse magnetron sputtering discharge (HiPIMS)
requires non-invasive diagnostic methods to characterise accurately spoke properties. A fast …