Pulse length selection in bipolar HiPIMS for high deposition rate of smooth, hard amorphous carbon films
Amorphous carbon films were deposited by bipolar HiPIMS, as a function of negative and
positive voltage pulse lengths (50-175 μs and 0-175 μs respectively), using argon as sputter …
positive voltage pulse lengths (50-175 μs and 0-175 μs respectively), using argon as sputter …
Mechanical properties of TiN deposited in synchronous bias mode through high-power impulse magnetron sputtering
Single or doubly ionized metal and gas ions (ie, N+, N 2+, Ti+, Ti 2+, Ar+) in the HiPIMS
plasma discharge of Ti contribute multiple functions, and the dissociated ions that arrive on a …
plasma discharge of Ti contribute multiple functions, and the dissociated ions that arrive on a …
Revisiting particle dynamics in HiPIMS discharges. I. General effects
A detailed experimental study of high power impulse magnetron sputtering processes is
performed by time-resolved imaging of the ground state sputtered particles. New details …
performed by time-resolved imaging of the ground state sputtered particles. New details …
Effects of Synchronous Bias Mode and Duty Cycle on Microstructure and Mechanical Properties of AlTiN Coatings Deposited via HiPIMS
The good mechanical properties of metal nitrides make them ideal surface coatings for
cutting tools and mold components. Conventional TiN coatings have largely been replaced …
cutting tools and mold components. Conventional TiN coatings have largely been replaced …
Microstructure of titanium coatings controlled by pulse sequence in multipulse HiPIMS
The deposition rate, as well as the structure of a coating for a given magnetron sputtered
material are determined by the plasma properties which are significantly dependent on the …
material are determined by the plasma properties which are significantly dependent on the …
Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering
In industrial magnetron sputtering processes, large DC-driven cathodes are commonly
employed. This work reports on industrially compatible technology, which allows for the …
employed. This work reports on industrially compatible technology, which allows for the …
Revisiting particle dynamics in HiPIMS discharges. II. Plasma pulse effects
A detailed experimental study of high power impulse magnetron sputtering discharges is
performed using time-resolved ground state density mapping of the sputtered neutrals and …
performed using time-resolved ground state density mapping of the sputtered neutrals and …
A xenon collisional-radiative model applicable to electric propulsion devices: III. Determination of the ionization fraction in low-temperature xenon plasma by using …
XM Zhu, YF Wang, SF Meng, Y Wang… - Plasma Sources …, 2023 - iopscience.iop.org
The ionization fraction is a key figure of merit for optimizing the performance of plasma
device. This work presents an optical emission spectroscopy (OES) method to determine the …
device. This work presents an optical emission spectroscopy (OES) method to determine the …
Temporal, spatial and spectroscopic study of plasma emission on Cu target in bipolar HiPIMS
P Klein, J Hnilica, D Lundin, P Dvořák… - Plasma Sources …, 2023 - iopscience.iop.org
Bipolar high power impulse magnetron sputtering introduces new possibilities to affect
positive ions created during the negative discharge pulse in order to tailor thin films with …
positive ions created during the negative discharge pulse in order to tailor thin films with …
Exploring different approaches of multipulse HiPIMS
Three different approaches for using high power impulse magnetron sputtering (HiPIMS)
with a titanium target were examined in terms of plasma diagnostics and coating properties …
with a titanium target were examined in terms of plasma diagnostics and coating properties …