TiB x thin films with a B content of 1.43≤ x≤ 2.70 were synthesized using high-power
impulse magnetron sputtering (HiPIMS) and direct-current magnetron sputtering (DCMS) …

This book is devoted to a thorough investigation of the physics and applications of the
vacuum arc–a highly-ionized metallic plasma source used in a number of applications–with …

The supersonic ion jet generated in vacuum arc plasma has numerous applications, but the
ion acceleration mechanism is incompletely understood. In this paper, a one-dimensional …

Titanium boride, TiB x, thin films are grown in pure Ar discharges by high-power impulse
magnetron sputtering (HiPIMS) from a compound TiB 2 target. Film compositions are …

Spectroscopic investigations of free-burning vacuum arcs in diffuse mode with CuCr
electrodes are presented. The experimental conditions of the investigated arc correspond to …

A model has been developed for the explosive electron emission cell pulse of a vacuum
discharge cathode spot that describes the ignition and extinction of the explosive pulse. The …

This investigation reports the influence of Ti–C and Ti–W cathode composition on an
industrial-scale dc vacuum arc plasma source. Further, we analyze the influence of plasma …

The article is aimed at studying the issue of spontaneous, ie, triggerless ignition of arcing
plasma splashes due to explosive-electronemission pulses at fiber-form nanostructured (W …

The optimization of magnetron sputter epitaxy (MSE) for the high-volume production of high-
quality GaN films is increasingly important. This study concerns the influence of key MSE …

The behavior of multicharged ions in the cathode spot of pulsed copper vacuum arc is
studied by the 2D3V electrostatic Particle-In-Cell Direct Simulation Monte Carlo method …