Ultralow-loss tightly confining Si3N4 waveguides and high-Q microresonators

H El Dirani, L Youssef, C Petit-Etienne, S Kerdiles… - Optics express, 2019 - opg.optica.org
Efficient nonlinear phenomena in integrated waveguides imply the realization in a nonlinear
material of tightly confining waveguides sustaining guided modes with a small effective area …

Advances in the atomic force microscopy for critical dimension metrology

D Hussain, K Ahmad, J Song… - Measurement Science and …, 2016 - iopscience.iop.org
Downscaling, miniaturization and 3D staking of the micro/nano devices are burgeoning
phenomena in the semiconductor industry which have posed sophisticated challenges in …

Development of three-dimensional atomic force microscope for sidewall structures imaging with controllable scanning density

H Xie, D Hussain, F Yang, L Sun - IEEE/ASME Transactions on …, 2015 - ieeexplore.ieee.org
In this paper, a three-dimensional atomic force microscope (3-D AFM) for imaging of the
micro-and nanoscale sidewall structures is presented. The system mainly consists of two …

Ab-initio modeling of bend-losses in silicon nitride waveguides from visible to near-infrared

JW Hinum-Wagner, SM Hoermann… - Optical Modeling …, 2023 - spiedigitallibrary.org
Integrated photonics features applications in high-speed telecommunication, computing,
and sensing. These devices are ultimately limited by the optical loss occurring in the …

Modeling of charging on unconventional surface morphologies of PMMA substrates during Ar plasma etching

G Memos, G Kokkoris - Plasma Processes and Polymers, 2016 - Wiley Online Library
The charging on unconventional, rough, surface morphologies of polymeric substrates is
investigated. The case study is Ar plasma etching of PMMA surfaces with sinusoidal profiles …

Sidewall imaging of microarray-based biosensor using an orthogonal cantilever probe

J Geng, H Zhang, X Meng, W Rong… - IEEE Transactions on …, 2021 - ieeexplore.ieee.org
We proposed a novel atomic force microscopy (AFM) technique based on the orthogonal
cantilever probe (OCP) for measuring the sidewall of microstructure/nanostructure. The OCP …

Multijunction solar cell mesa isolation: Correlation between process, morphology and cell performance

M de Lafontaine, F Ayari, E Pargon, G Gay… - Solar Energy Materials …, 2022 - Elsevier
Multijunction solar cells must be electrically isolated from one to another at the end of the
fabrication process; a step known as mesa isolation. In this study, three different techniques …

Design and realization of scanning probe microscope based on a T-shaped high-aspect-ratio probe

R Xu, Y Liu, C Ren, Y Zhang… - Measurement Science and …, 2023 - iopscience.iop.org
With the growing importance of three-dimensional (3D) nanomaterials and devices, the use
of high-aspect-ratio (HAR) probes in atomic force microscopy (AFM) imaging enables full …

A CD probe with a tailored cantilever for 3D-AFM measurement

R Zhang, S Wu, L Liu, NH Lu, X Fu… - Measurement Science …, 2018 - iopscience.iop.org
A critical dimensional (CD) probe, such as a boot shaped probe, is widely used for
measuring the sidewall profiles of nanostructures in atomic force microscopy (AFM) …

Atomic force microscope caliper for critical dimension measurements of micro and nanostructures through sidewall scanning

H Xie, D Hussain, F Yang, L Sun - Ultramicroscopy, 2015 - Elsevier
A novel atomic force microscope (AFM) dual-probe caliper for critical dimension (CD)
metrology has been developed. The caliper is equipped with two facing tilted optical fiber …