I Seidler, M Neul, E Kammerloher, M Künne… - Physical Review …, 2023 - APS
Gate layouts of spin-qubit devices are commonly adapted from previous successful devices. As qubit numbers and device complexity increase, modeling new device layouts and …
This paper reviews recent experimental approaches to the development of surface nanostructures from nanoparticles. The formation of nanowires by electron beam writing in …
G Dahm, IW Rangelow, P Hudek… - Microelectronic …, 1995 - Elsevier
In this paper a technology for dry etching of quartz for the fabrication of Phase Shift Masks (PSMs) and micromechanic applications is presented. Reactive Ion Etching (RIE) with …
IW Rangelow, P Hudek, F Shi - Vacuum, 1995 - Elsevier
This paper reports on the development of a technology which will offer the potential to manufacture micro-engines, micro-turbines, micro-sensors, micro-actuators and electronic …
Recent developments of lithographic techniques as well as improved chemical synthesis methods allow researchers to engineer novel nanostructured materials consisting of arrays …
IW Rangelow, P Hudek - Photons and Local Probes, 1995 - Springer
The term “microfabrication” has been used to denote the technology for manufacturing integrated micro-circuits and microsystems. During the last 30 years the advanced micro …
V Rousset, S Itoua, C Joachim, F Tsobnang… - …, 1996 - iopscience.iop.org
A process is presented to fabricate a coplanar buried metal--metal junction on the surface. The surface is etched with reactive ion etching (RIE) through a PMMA mask where the …
P Hudek, IW Rangelow, I Kostic, N Münzel… - Microelectronic …, 1996 - Elsevier
The electron-beam response of new chemically amplified positive multi-component ARCH- resist family (ARCH and ARCH2) and the suitability of pattern transfer through single layer …
The structure and magnetism of Au/Co multilayers grown on patterned substrates are investigated. The structure and morphology are studied by means of X-ray diffraction spectra …