Nanoelectronic devices from self-organized molecular switches

PM Mendes, AH Flood, JF Stoddart - Applied Physics A, 2005 - Springer
The development of molecular electronic switching devices for memory and computing
applications presents one of the most exciting contemporary challenges in nanoscience and …

Tailoring potentials by simulation-aided design of gate layouts for spin-qubit applications

I Seidler, M Neul, E Kammerloher, M Künne… - Physical Review …, 2023 - APS
Gate layouts of spin-qubit devices are commonly adapted from previous successful devices.
As qubit numbers and device complexity increase, modeling new device layouts and …

Nanostructures from nanoparticles

PM Mendes, Y Chen, RE Palmer, K Nikitin… - Journal of Physics …, 2003 - iopscience.iop.org
This paper reviews recent experimental approaches to the development of surface
nanostructures from nanoparticles. The formation of nanowires by electron beam writing in …

Quartz etching for phase shifting masks

G Dahm, IW Rangelow, P Hudek… - Microelectronic …, 1995 - Elsevier
In this paper a technology for dry etching of quartz for the fabrication of Phase Shift Masks
(PSMs) and micromechanic applications is presented. Reactive Ion Etching (RIE) with …

Bulk micromachining of Si by lithography and reactive ion etching (LIRIE)

IW Rangelow, P Hudek, F Shi - Vacuum, 1995 - Elsevier
This paper reports on the development of a technology which will offer the potential to
manufacture micro-engines, micro-turbines, micro-sensors, micro-actuators and electronic …

Fabrication of novel magnetic nanostructures by colloidal bimetallic nanocrystals and multilayers

M Angelakeris, O Crisan, E Papaioannou… - Materials Science and …, 2003 - Elsevier
Recent developments of lithographic techniques as well as improved chemical synthesis
methods allow researchers to engineer novel nanostructured materials consisting of arrays …

Lithography and reactive ion etching in microfabrication

IW Rangelow, P Hudek - Photons and Local Probes, 1995 - Springer
The term “microfabrication” has been used to denote the technology for manufacturing
integrated micro-circuits and microsystems. During the last 30 years the advanced micro …

Fabrication of submicrometre buried gold-palladium wires on using electron beam lithography

V Rousset, S Itoua, C Joachim, F Tsobnang… - …, 1996 - iopscience.iop.org
A process is presented to fabricate a coplanar buried metal--metal junction on the surface.
The surface is etched with reactive ion etching (RIE) through a PMMA mask where the …

Evaluation of chemically amplified deep UV resis for micromachining using e-beam lithography and dry etching

P Hudek, IW Rangelow, I Kostic, N Münzel… - Microelectronic …, 1996 - Elsevier
The electron-beam response of new chemically amplified positive multi-component ARCH-
resist family (ARCH and ARCH2) and the suitability of pattern transfer through single layer …

The influence of patterned substrates on structure and magnetism of Au/Co multilayers

M Angelakeris, ET Papaioannou, O Valassiades… - Journal of Magnetism …, 2004 - Elsevier
The structure and magnetism of Au/Co multilayers grown on patterned substrates are
investigated. The structure and morphology are studied by means of X-ray diffraction spectra …