Physical vapour deposition (PVD) is a well-known technology that is widely used for the
deposition of thin films regarding many demands, namely tribological behaviour …

Advanced coatings play an important role in a wide range of industrial applications. These
coatings are commonly used in machining tools due to their high hardness and wear …

Atomic layer deposition is a highly sought-after technique with high conformal and quality
film deposition. This study reviewed thin-film technology comprehensively and narrowed it to …

The present review provides an overview of the basic theory of sputtering with recent
models, focusing in particular on sputtered atom energy distribution functions. Molecular …

Titanium carbide materials are introduced into manufacturing industries for the
reinforcement and surface protection of base materials due to their substantial ability to …

Titanium carbide (TiC) thin films were deposited by radio frequency magnetron sputtering
(RFMS) onto a copper substrate by using Argon (Ar) gas plasma at a gas flow rate of 10.0 …

Abstract Physical Vapour Deposition (PVD) is a process usually used for the production of
advanced coatings regarding its application in several industrial and current products, such …

The technological evolution in the last century also required an evolution of materials and
coatings. Therefore, it was necessary to make mechanical components subject to heavy …

Simulation and modeling find more and more their way into thin film technology. Beside
theoretical models for layer design, pre-production design analysis, and real time process …

In the present study, we propose the use of a light, inert carrier gas to support deposition
uniformity and rate in continuous physical vapor deposition, in which closely spaced slots or …