Three-dimensional plasmonic lithography imaging modeling based on the RCWA algorithm for computational lithography

H Ding, T Fan, L Zhang, Y Wei, T Ye - Optics Express, 2023 - opg.optica.org
This paper reminds the principle and characteristics of plasmonic lithography, and points out
the importance of establishing a fast and high precision plasmonic lithography imaging …

Infrared studies and spectral properties of photochromic high silica glasses

MA Girsova, GF Golovina, IA Drozdova… - Optica …, 2014 - yadda.icm.edu.pl
The structure of photochromic high silica glasses (PHSGs) was studied by UV–VIS–NIR and
IR spectroscopy, transmission electron microscopy (TEM) and X-ray diffraction (XRD) …

Modeling and experimental study of plasmonic lens imaging with resolution enhanced methods

Z Zhao, Y Luo, N Yao, W Zhang, C Wang, P Gao… - Optics …, 2016 - opg.optica.org
Plasmonic lens imaging with some resolution enhancement methods are investigated in this
paper, mainly by physical modeling and numerical simulations. The imaging model is based …

Plasmonic superlens imaging enhanced by incoherent active convolved illumination

W Adams, A Ghoshroy, DO Guney - ACS Photonics, 2018 - ACS Publications
We introduce a loss compensation method to increase the resolution of near-field imaging
with a plasmonic superlens that relies on the convolution of a high spatial frequency …

Rigorous analysis and systematical design of double-layer metal superlens for improved subwavelength imaging mediated by surface plasmon polaritons

J Wang, Z Li, W Liu - Nanomaterials, 2022 - mdpi.com
A double-layer metal superlens was rigorously analyzed and systematically designed to
improve subwavelength imaging ability. It was revealed that transmission properties of the …

Sensitivity of imaging properties of metal-dielectric layered flat lens to fabrication inaccuracies

R Kotyński, H Baghdasaryan, T Stefaniuk… - Opto-Electronics …, 2010 - Springer
We characterize the sensitivity of imaging properties of a layered silver-TiO 2 flat lens to
fabrication inaccuracies. The lens is designed for approximately diffraction-free imaging with …

Off-axis illumination to solve the forbidden pitch problem in plasmonic lithography

H Ding, Y Su, Y Wei - Optics & Laser Technology, 2025 - Elsevier
The state of the art for plasmonic lithography and the phenomenon of forbidden pitch are
introduced. Combined with the Optical transfer function (OTF) characteristic curve of the …

Mask 3D parameter optimization for improving imaging contrast of plasmonic lithography

J He, H Ding, Y Wei, T Ye - Applied Optics, 2024 - opg.optica.org
Based on plasmonic lithography (PL) technology, and aiming at the special nano-optical
effect of metal/dielectric multilayer composites and mask three-dimensional (M3D) effect, a …

Study on forbidden pitch in plasmonic lithography: taking 365 nm wavelength thin silver film-based superlens imaging lithography as an example

H Ding, L Liu, L Dong, D Han, T Fan, L Zhang… - Optics Express, 2022 - opg.optica.org
Plasmonic lithography can make the evanescent wave at the mask be resonantly amplified
by exciting surface plasmon polariton (SPP) and participate in imaging, which can break …

Structure and spectral properties of the silver-containing high-silica glasses

MA Girsova, GF Golovina, IN Anfimova… - Journal of Physics …, 2016 - iopscience.iop.org
Silver-containing high-silica glasses were synthesized by an impregnation of the silica
porous glasses (PGs) first with AgNO 3 aqueous solution (with or without the presence of the …