Investigation of self-heating effects in vertically stacked GAA MOSFET with wrap-around contact

SJ Kang, JH Kim, YS Song, S Go… - IEEE Transactions on …, 2022 - ieeexplore.ieee.org
A contact resistance () becomes a major parasitic resistance in highly scaled modern
semiconductor devices. A wrap-around contact (WAC) has been suggested as a promising …

Improvement in self-heating characteristic by incorporating hetero-gate-dielectric in gate-all-around MOSFETs

YS Song, JH Kim, G Kim, HM Kim… - IEEE Journal of the …, 2020 - ieeexplore.ieee.org
For improving self-heating effects (SHEs) in gate-all-around metal-oxide-semiconductor field-
effect transistors (GAA MOSFETs), hetero-gate-dielectric (HGD) is utilized. The HGD consists …

Thermal-aware IC chip design by combining high thermal conductivity materials and GAA MOSFET

YS Song, S Tayal, SB Rahi, JH Kim… - … on Circuits, Systems …, 2022 - ieeexplore.ieee.org
The high integration of integrated circuit (IC) chip design has made thermal-aware design as
one of the first priorities of the modern IC chip industry. Even though the modern IC chip …

Drain breakdown in submicron MOSFETs: a review

H Wong - Microelectronics Reliability, 2000 - Elsevier
This paper reviews the physics and models of drain breakdown in short-channel MOSFET.
Four mechanisms, namely,(1) avalanche breakdown (MI mode),(2) finite multiplication with …

Investigation of self-heating effects in gate-all-around MOSFETs with vertically stacked multiple silicon nanowire channels

JY Park, BH Lee, KS Chang, DU Kim… - … on Electron Devices, 2017 - ieeexplore.ieee.org
The self-heating effects (SHEs) in gate-all-around (GAA) MOSFETs with vertically stacked
silicon nanowire (SiNW) channels are investigated. Direct observations using thermal …

Electrothermal effects on hot-carrier reliability in SOI MOSFETs—AC versus circuit-speed random stress

W Chen, R Cheng, DW Wang, H Song… - … on Electron Devices, 2016 - ieeexplore.ieee.org
Computational study of electrothermal effects on hot-carrier injection (HCI) in 100-nm silicon-
on-insulator (SOI) MOSFET for digital integrated circuit is performed using in-house …

Narrow-width SOI devices: The role of quantum-mechanical size quantization effect and unintentional doping on the device operation

D Vasileska, SS Ahmed - IEEE Transactions on Electron …, 2005 - ieeexplore.ieee.org
The ultimate limits in scaling of conventional MOSFET devices have led the researchers
from all over the world to look for novel device concepts, such as ultrathin-body (UTB) silicon …

A thermal activation view of low voltage impact ionization in MOSFETs

P Su, K Goto, T Sugii, C Hu - IEEE Electron Device Letters, 2002 - ieeexplore.ieee.org
The authors present a thermal activation perspective for direct assessment of the low voltage
impact ionization in deep-submicrometer MOSFETs. A comparison of the experimentally …

Electrothermal effects on hot carrier injection in n-type SOI FinFET under circuit-speed bias

P Zhang, W Chen, J Hu, WY Yin - IEEE Transactions on …, 2017 - ieeexplore.ieee.org
Electrothermal study of the n-type SOI Fin-FETs at 50-nm node is performed by analytical
method and numerical algorithm. The self-heating effects (SHE) are investigated and …

Efficient monte carlo device modeling

FM Bufler, A Schenk, W Fichtner - IEEE Transactions on …, 2000 - ieeexplore.ieee.org
A single-particle approach to full-band Monte Carlo device simulation is presented which
allows an efficient computation of drain, substrate and gate currents in deep submicron …