Challenges in material processing and reliability issues in AlGaN/GaN HEMTs on silicon wafers for future RF power electronics & switching applications: A critical …

J Ajayan, D Nirmal, P Mohankumar, B Mounika… - Materials Science in …, 2022 - Elsevier
In order to handle high power with good thermal stability at RF & microwave frequencies
wider bandgap semiconductor based transistors are highly desirable and GaN & AlGaN …

Challenges and opportunities for high-power and high-frequency AlGaN/GaN high-electron-mobility transistor (HEMT) applications: A review

M Haziq, S Falina, AA Manaf, H Kawarada, M Syamsul - Micromachines, 2022 - mdpi.com
The emergence of gallium nitride high-electron-mobility transistor (GaN HEMT) devices has
the potential to deliver high power and high frequency with performances surpassing …

Polarization induced doping and high-k passivation engineering on T-gate MOS-HEMT for improved RF/microwave performance

M Sharma, B Kumar, R Chaujar - Materials Science and Engineering: B, 2023 - Elsevier
High electron-mobility transistors (HEMTs) based on III-nitrides are well-known as ideal
choices for high-power, radio-frequency applications. HEMTs, on the other hand, must deal …

RF/analog and linearity performance evaluation of lattice-matched ultra-thin AlGaN/GaN gate recessed MOSHEMT with silicon substrate

AN Khan, K Jena, S Routray, G Chatterjee - Silicon, 2022 - Springer
In this article, the authors have demonstrated and analyzed various analog/RF, and linearity
performances of an AlGaN/GaN gate recessed MOSHEMT (GR-MOSHEMT) grown on a Si …

Analytical model for two-dimensional electron gas charge density in recessed-gate GaN high-electron-mobility transistors

S Sharbati, I Gharibshahian, T Ebel, AA Orouji… - Journal of Electronic …, 2021 - Springer
A physics-based analytical model for GaN high-electron-mobility transistors (HEMTs) with
non-recessed-and recessed-gate structure is presented. Based on this model, the two …

[HTML][HTML] LG= 50 nm T-gated and Fe-doped double quantum well GaN‒HEMT on SiC wafer with graded AlGaN barrier for future power electronics applications

B Mounika, J Ajayan, S Bhattacharya, D Nirmal… - Journal of Science …, 2024 - Elsevier
High-performance LG= 50 nm graded double-channel (GDC)-HEMT featuring AlN top
barrier, recessed T-gate and graded-AlGaN bottom barrier is designed and investigated …

Simulation modelling of III‐Nitride/β‐Ga2O3 Nano‐HEMT for microwave and millimetre wave applications

GP Rao, R Singh, TR Lenka… - … Journal of RF and …, 2022 - Wiley Online Library
In this piece of work, a recessed gate field‐plated AlGaN/AlN/GaN HEMT on β‐Ga2O3
substrate is proposed and its performance characteristics are compared with HEMT structure …

Impact of AlInN Back-Barrier Over AlGaN/GaN MOS-HEMT With HfO₂ Dielectric Using Cubic Spline Interpolation Technique

V Sandeep, JC Pravin, AR Babu… - IEEE Transactions on …, 2020 - ieeexplore.ieee.org
The dc characteristics of AlGaN/gallium nitride (GaN) metal-oxide-semiconductor-high
electron mobility transistor (MOS-HEMT) with an AlInN back-barrier layer has been studied …

Back-gate bias effect on the linearity of pocket doped FDSOI MOSFET

RR Shaik, L Chandrasekar, JP Raskin… - Microelectronics …, 2022 - Elsevier
In this article, we investigate the feasibility of enhancing the linearity Figures of Merit (FoMs)
by introducing pocket implant in the source/drain regions of the FDSOI MOSFET with ground …

Tri-Gate Normally-Off AlN/GaN HEMTs With 2.36 W/mm of Power Density and 67.5% Power-Added-Efficiency at Vd = 12 V

J Guo, J Zhu, S Liu, K Cheng, Q Zhu… - IEEE Electron …, 2023 - ieeexplore.ieee.org
In this letter, we present high-performance tri-gate normally-off HEMTs RF power devices
using MOCVD-grown thin barrier SiN/AlN/GaN heterostructures. The normally-off devices …