Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

ZnO grown by atomic layer deposition (ALD) is an interesting material for electronic
applications requiring low processing temperature. Herein, it is shown that the electrical …

The paper presents results for zinc oxide films grown at low-temperature regime by atomic
layer deposition (ALD). We discuss electrical properties of such films and show that low …

Investigations of the structural, morphological and electrical properties of multilayer ZnO/TiO
2 thin films deposited by sol–gel technique on glass substrate. Sol–gel is a technique in …

The structural, optical, and electrical properties of ZnO are intimately intertwined. In the
present work, the structural and transport properties of 100 nm thick polycrystalline ZnO films …

Aluminum-doped zinc oxide (AZO) films were grown by atomic layer deposition at 200° C.
The influence of Al content on the structure, optical, and electrical properties of AZO films …

Carbon nanotube fibers (CNTFs) are endowed with excellent mechanical, electrical, and
thermal properties and are considered promising candidates in numerous cutting‐edge …

We present a kinetic model for the reaction of diethylzinc (DEZ) adsorption in atomic layer
deposition (ALD) of ZnO from DEZ and water. The proposed model has been verified by …

In this work, we have studied the transfer of phonon energy in hybrid structure of pillared
graphene and boron nitride film. The obtained results showed that, due to the occurrence of …

In this study, ZnO thin films are deposited by sol–gel technique on p-type crystalline silicon
(Si) with [100] orientation, etched silicon and porous silicon. The structural analyses showed …